Plans for developing turbines in Brazil were present on the conception of CTA six decades ago. In this manner highly specialized work teams is needed to carry out such activity. The Center for Reference on Gas Turbine group has been contributing to research activities at CTA taking account of the study of gas turbines both aeronautical and industrial. In order to complement the group capability and study more complex turbine applications, it is a topic of interest to study steam turbines. Taking advantage from the experience gathered at CRTG, design and performance analysis approaches for axial gas turbines were applied to steam turbines, adjusting the models for working with superheated steam using a loss model for axial turbomachinery to estimate the total pressure loss into the turbine cascade. Such models were implemented in a computer code written in FORTRAN, disposed for reading the design requirements or the conditions for the performance analysis, making the corresponding calculation and reporting the results. It was performed a verification on the results from the design routine, comparing them with data from a commercial program for axial turbine simulation and the used such results to assess its performance at off-design conditions. A case study was conducted regarding a multistage steam turbine working in a combined cycle with a gas turbine. From the energy of the gas turbine exhaust, a three stages steam turbine of 0.5 MW of power was designed. Later, with additional energy generated in the boiler in order to produce more steam, the power capacity of the steam turbine was increased. The results reported from both routines were qualitative consistent to what it was expected a turbine design and off-design performance analysis could be.

by Ranganathan Venugopal. / Thesis (Ph.D.)--Chinese University of Hong Kong, 2001. / Includes bibliographical references (p. 150-165). / Electronic reproduction. Hong Kong : Chinese University of Hong Kong, [2012] System requirements: Adobe Acrobat Reader. Available via World Wide Web. / Mode of access: World Wide Web. / Abstracts in English and Chinese.

by Lai Kwong-Yu. / Thesis submitted in: December 1998. / Thesis (M.Phil.)--Chinese University of Hong Kong, 1999. / Includes bibliographical references (leaves 90-101). / Abstracts in English and Chinese. / Chapter 1 --- Introduction --- p.1 / Chapter 1.1 --- Metal Silicides --- p.1 / Chapter 1.2 --- Titanium Silicide --- p.8 / Chapter 1.3 --- Goal Of This Project --- p.10 / Chapter 2 --- Sample Preparation And Experimental Methods --- p.12 / Chapter 2.1 --- MEVVA Implantation --- p.12 / Chapter 2.2 --- Sample Preparation --- p.15 / Chapter 2.2.1 --- Implantation Condition --- p.15 / Chapter 2.2.2 --- Thermal Treatment --- p.19 / Chapter 2.3 --- Characterization Methods --- p.20 / Chapter 2.3.1 --- Sheet Resistivity Measurement --- p.22 / Chapter 2.3.2 --- X-Ray Diffraction (XRD) --- p.25 / Chapter 2.3.3 --- Rutherford Backscattering Spectroscopy (RBS) --- p.28 / Chapter 2.3.4 --- Transmission Electron Microscopy (TEM) --- p.31 / Chapter 3 --- Characterization of As-implanted Samples --- p.36 / Chapter 3.1 --- Introduction --- p.36 / Chapter 3.2 --- Dose Dependence Of As-implanted Samples --- p.37 / Chapter 3.2.1 --- Sheet Resistance Measurement --- p.37 / Chapter 3.2.2 --- X-Ray Diffraction (XRD) --- p.40 / Chapter 3.2.3 --- Rutherford Backscattering Spectroscopy (RBS) --- p.40 / Chapter 3.3 --- Implant Beam Current Dependence Of As-implanted Samples --- p.43 / Chapter 3.3.1 --- Sheet Resistance Measurement --- p.43 / Chapter 3.3.2 --- X-Ray Diffraction (XRD) --- p.44 / Chapter 3.3.3 --- Rutherford Backscattering Spectroscopy (RBS) --- p.46 / Chapter 3.4 --- Transmission Electron Microscopy (TEM) --- p.48 / Chapter 3.5 --- Summary --- p.52 / Chapter 4 --- Characterization of Annealed Samples --- p.57 / Chapter 4.1 --- Introduction --- p.57 / Chapter 4.2 --- Dose Dependence Of Annealed Samples --- p.58 / Chapter 4.2.1 --- Sheet Resistance Measurements --- p.58 / Chapter 4.2.2 --- X-Ray Diffraction (XRD) --- p.61 / Chapter 4.2.3 --- Rutherford Backscattering Spectroscopy (RBS) --- p.63 / Chapter 4.3 --- Implant Beam Current Dependence Of Annealed Samples --- p.66 / Chapter 4.3.1 --- Sheet Resistance Measurement --- p.66 / Chapter 4.3.2 --- X-Ray Diffraction (XRD) --- p.68 / Chapter 4.3.3 --- Rutherford Backscattering Spectroscopy (RBS) --- p.70 / Chapter 4.4 --- Annealing Temperature Dependence Of Annealed Samples --- p.71 / Chapter 4.4.1 --- Sheet Resistance Measurement --- p.71 / Chapter 4.4.2 --- X-Ray Diffraction (XRD) --- p.73 / Chapter 4.4.3 --- Rutherford Backscattering Spectroscopy (RBS) --- p.75 / Chapter 4.5 --- Annealing Time Dependence Of Annealed Samples --- p.78 / Chapter 4.5.1 --- Sheet Resistance Measurement --- p.78 / Chapter 4.5.2 --- X-Ray Diffraction (XRD) --- p.79 / Chapter 4.5.3 --- Rutherford Backscattering Spectroscopy (RBS) --- p.81 / Chapter 4.6 --- Transmission Electron Microscopy (TEM) --- p.82 / Chapter 4.7 --- Summary --- p.84 / Chapter 5 --- Conclusion --- p.87 / Chapter 5.1 --- Main Results Of This Work --- p.87 / Chapter 5.2 --- Suggestions To Future Works --- p.89 / Bibliography

by Kong Lim Pun. / Thesis (M.Phil.)--Chinese University of Hong Kong, 2000. / Includes bibliographical references. / Text in English; abstracts in English and Chinese. / by Kong Lim Pun. / ABSTRACT --- p.i / 摘要 --- p.iii / ACNOWLEDGEMENT --- p.iv / TALE OF CONTENTS --- p.v / LIST OF FIGURES --- p.ix / LIST OF TABLES --- p.xi / Chapter CHAPTER 1 --- Introduction / Chapter 1.1 --- Nanoparticles and nanostructural materials --- p.1 / Chapter 1.2 --- Materials of copper-implanted and nickel-implanted fused silica --- p.4 / Chapter 1.2.1 --- Overview --- p.4 / Chapter 1.2.2 --- Formation of nanoparticles --- p.5 / Chapter 1.2.3 --- Optical properties of the material --- p.9 / Chapter 1.3 --- Goals of the project --- p.12 / Reference --- p.13 / Chapter CHAPTER 2 --- Background of Study / Chapter 2.1 --- Introduction --- p.15 / Chapter 2.2 --- Optical absorption of metal nanocluster composite glasses --- p.16 / Chapter 2.2.1 --- Dielectric constant --- p.16 / Chapter 2.2.2 --- The features of surface plasmon resonance peak --- p.16 / Chapter 2.3 --- Third-order optical nonlinearity of metal nanocluster composite glasses --- p.17 / Chapter 2.3.1 --- Classical field confinement --- p.19 / Chapter 2.3.2 --- Quantum confinement --- p.21 / Chapter 2.3.2.1 --- Intraband transitions --- p.21 / Chapter 2.3.2.2 --- Interband transitions --- p.22 / Chapter 2.3.2.3 --- Hot-electron transitions --- p.22 / Chapter 2.4 --- Preparation Methods of MNCG(s) --- p.23 / Chapter 2.4.1 --- Ion implantation --- p.23 / Chapter 2.4.2 --- Ion exchange --- p.23 / Chapter 2.4.3 --- Sputtering deposition --- p.24 / Chapter 2.4.4 --- Melt -quenching and heat-treatment processes --- p.25 / Chapter 2.4.5 --- Ion-beam assisted deposition --- p.25 / Chapter 2.5 --- Applications --- p.25 / Reference --- p.27 / Chapter CHAPTER 3 --- Instrumentation / Chapter 3.1 --- Introduction --- p.29 / Chapter 3.2 --- Metal Vapour Vacuum Arc (MEVVA) ion source implantation --- p.29 / Chapter 3.2.1 --- Background of MEVVA ion source --- p.29 / Chapter 3.2.2 --- Characteristics of MEVVA ion source --- p.32 / Chapter 3.2.3 --- Implantation conditions --- p.33 / Chapter 3.3 --- X-ray photoelectron spectroscopy --- p.34 / Chapter 3.3.1 --- Theory --- p.34 / Chapter 3.3.2 --- Qualitative analysis --- p.38 / Chapter 3.3.2.1 --- Chemical shift peaks --- p.40 / Chapter 3.3.2.2 --- Auger peaks --- p.40 / Chapter 3.3.2.3 --- Energy loss peaks --- p.40 / Chapter 3.3.3 --- Quantitative analysis --- p.41 / Chapter 3.3.3.1 --- Homogeneous system --- p.41 / Chapter 3.3.3.2 --- Determination of layer thickness --- p.45 / Chapter 3.3.4 --- Instrumental components of XPS --- p.47 / Chapter 3.3.4.1 --- Sample introduction system --- p.47 / Chapter 3.3.4.2 --- X-ray source --- p.49 / Chapter 3.3.5 --- Application to metal nanoclusters composite glasses --- p.49 / Chapter 3.3.5.1 --- Compositional analysis --- p.50 / Chapter 3.3.5.2 --- Depth profiling --- p.50 / Chapter 3.3.5.3 --- Auger parameter --- p.50 / Chapter 3.4 --- Transmission electron microscopy --- p.53 / Chapter 3.4.1 --- Basic instrumentation of TEM --- p.53 / Chapter 3.4.2 --- Preparation of TEM cross section specimen --- p.54 / Chapter 3.4.2.1 --- Cutting --- p.54 / Chapter 3.4.2.2 --- "Disc-cutting, grinding, dimpling " --- p.54 / Chapter 3.4.2.3 --- Ion beam thinning --- p.56 / Chapter 3.4.3 --- Image contrast of TEM --- p.56 / Chapter 3.4.4 --- Basic operations of TEM --- p.57 / Chapter 3.4.4.1 --- Bright field and dark field images --- p.57 / Chapter 3.4.4.2 --- Selected area diffraction (SAD) --- p.58 / Chapter 3.4.4.3 --- Convergent Beam Electron Diffraction --- p.59 / Reference --- p.60 / Chapter CHAPTER 4 --- Composition and Nano structure of Copper-implanted Fused Silica / Chapter 4.1 --- Introduction --- p.62 / Chapter 4.2 --- The Atomic Distribution and Chemical State of Copper Nanocluster --- p.64 / Chapter 4.3 --- TEM Studies of Copper Nanoclusters --- p.70 / Chapter 4.4 --- Theoretical Calculation on Ratio of Surface to Bulk Atoms of Copper Nanocluster --- p.73 / Chapter 4.5 --- Conclusions --- p.74 / Reference --- p.77 / Chapter CHAPTER 5 --- Composition and Nanostructure of Nickel-implanted Fused Silica / Chapter 5.1 --- Introduction --- p.79 / Chapter 5.2 --- The distribution of nickel nanoclusters --- p.80 / Chapter 5.3 --- TEM studies of nickel nanoclusters --- p.81 / Chapter 5.4 --- Chemical state of nickel clusters --- p.87 / Chapter 5.5 --- Discussion --- p.90 / Chapter 5.6 --- Conclusion --- p.90 / Reference --- p.92 / Chapter CHAPTER 6 --- Conclusions --- p.94

Esta tesis presenta el siguiente objetivo: Desarrollar un sistema de control avanzado de la variación de la presión del vapor en el cuerpo de una caldera de tubos de fuego, que posibilite un funcionamiento efectivo y fiable del proceso de combustión, así como una disminución del actual consumo de combustible y de los gases contaminantes del medio ambiente. / Tesis

Thesis (M.S.)--Massachusetts Institute of Technology, Dept. of Chemical Engineering, 1981. / MICROFICHE COPY AVAILABLE IN ARCHIVES AND SCIENCE. / Bibliography: leaves 43-44. / by Miral Eonhah Kim-E. / M.S.

Este trabalho apresenta o estudo da dinâmica de uma instalação propulsora a vapor através da técnica da modelagem e simulação. O modelo matemático é obtido das Leis da Termodinâmica e dos conceitos básicos da mecânica dos fluídos e transferência de calor, e a simulação é efetuada em um computador digital. Inicialmente cada componente do ciclo é modelado individualmente, determinando-se as suas variáveis de estado, de entrada e de saída. A seguir o modelo é simulado para analisar a influência dos diversos parâmetros nas respostas do elemento. O modelo matemático da instalação propulsora a vapor é obtido agrupando-se convenientemente os modelos dos vários componentes do ciclo. Com isso obtêm-se um sistema de 47ª ordem que pode simular diversos casos de interesse real. Neste trabalho são analisadas as respostas do ciclo para dois casos. A primeira corresponde ao fechamento parcial da válvula de controle da turbina e a segunda ao corte na vazão de óleo combustível. / This paper presents a study of the dynamics of a steam power plant using techniques of modelling and simulation. The mathematical model derives form the laws of Thermodynamics and basic concepts of fluid mechanics and heat transfer; the simulation is carried out in a digital computer. Each component is first modelled individually, and its state, input and output variables are determined. The model is then simulated for the analysis of the influence of the various parameters in the responses of the component. The mathematical model of the complete power plant is constructed by the convenient grouping of the various component models of the cycle. Thereby a 47th order system is obtained, which can simulate various cases of interest. The cycle\'s response for two cases are analysed. The first case correspond to the partial closing of the turbine control valve and the second to the fuel flow interruption .

Leung Yee Pan = 利用有機金屬化學氣相沉積方法生長一維硒化鋅鈉米結構 / 梁懿斌. / Thesis (M.Phil.)--Chinese University of Hong Kong, 2004. / Includes bibliographical references (leaves 80-82). / Text in English; abstracts in English and Chinese. / Leung Yee Pan = li yong you ji jin shu hua xue qi xiang chen ji fang fa sheng chang yi wei xi hua xin na mi jie gou / Liang Yibin. / Acknowledgements --- p.ii / Abstract --- p.iii / Chapter Chapter 1 - --- Introduction --- p.1 / Chapter 1.1 --- Background --- p.1 / Chapter 1.2 --- Motivation --- p.3 / Chapter 1.2.1 --- ZnSe --- p.3 / Chapter 1.2.2 --- MOCVD --- p.3 / Chapter 1.3 --- Our Work --- p.4 / Chapter Chapter 2 - --- Experiment --- p.5 / Chapter 2.1 --- MOCVD System --- p.5 / Chapter 2.2 --- Metalorganic Sources --- p.5 / Chapter 2.3 --- Substrates --- p.7 / Chapter 2.4 --- Substrate Preparations --- p.7 / Chapter 2.5 --- Preheating (Applied Only when Using GaAs Substrates) --- p.7 / Chapter 2.6 --- Growth of Epi-layer (Applied Only when Using GaAs Substrates) --- p.8 / Chapter 2.7 --- Growth of ZnSe Nanowires on Si(100) and ZnSe/GaAs(100) --- p.8 / Chapter 2.8 --- The Samples --- p.9 / Chapter Chapter 3 - --- Characterization --- p.10 / Chapter 3.1 --- Surface Morphologies --- p.10 / Chapter 3.1.1 --- Scanning Electron Microscopy --- p.10 / Chapter 3.1.2 --- Atomic Force Microscopy --- p.12 / Chapter 3.2 --- Structural Properties - X-Ray Diffraction --- p.13 / Chapter 3.3 --- Optical Properties - Photoluminescence --- p.15 / Chapter 3.4 --- Other Techniques --- p.16 / Chapter Chapter 4 - --- Results --- p.17 / Chapter 4.1 --- ZnSe Nanowires Grown on Si(100) --- p.17 / Chapter 4.1.1 --- Effect of Growth Temperature --- p.17 / Chapter 4.2 --- Growth of ZnSe Nanowires on GaAs( 100) - The First Trial --- p.20 / Chapter 4.3 --- Optimizing the ZnSe Epi-layer --- p.21 / Chapter 4.3.1 --- Surface of GaAs(100) --- p.21 / Chapter 4.3.2 --- ZnSe Epi-layer Grown at Different Reactor Pressures --- p.22 / Chapter 4.4 --- Importance of Au --- p.26 / Chapter 4.5 --- Growth of ZnSe Nanowires on GaAs(lOO) - A Systematic Study --- p.28 / Chapter 4.5.1 --- Growth Rates --- p.28 / Chapter 4.5.2 --- Overall Morphologies --- p.32 / Chapter 4.5.3 --- Classifying the Morphologies --- p.37 / Chapter 4.5.4 --- Abundances of Different Morphologies of Different Samples --- p.40 / Chapter 4.5.5 --- Growth Direction --- p.45 / Chapter 4.5.6 --- Structure of the Nanowires --- p.50 / Chapter 4.5.7 --- Optical Properties of the Nanowires --- p.54 / Chapter Chapter 5 - --- Discussions --- p.57 / Chapter 5.1 --- Overview of the MOCVD Process --- p.57 / Chapter 5.1.1 --- Effects of Growth Temperature on Growth Rate of MOCVD --- p.58 / Chapter 5.1.2 --- Effects of Reactor Pressure on Growth Rate of MOCVD --- p.59 / Chapter 5.2 --- Effect of Reactor Pressure on the Growth Rate of the Nanowires --- p.60 / Chapter 5.3 --- Growth Mechanisms of the Nanowires --- p.64 / Chapter 5.3.1 --- VLS Mechanism --- p.64 / Chapter 5.3.2 --- Spiral Growth Mechanism --- p.66 / Chapter 5.3.3 --- Reentrant Corner Mechanism --- p.67 / Chapter 5.3.4 --- Roles of Au Particles and ZnSe Epi-layer --- p.68 / Chapter 5.3.5 --- Growth Mechanisms of Different Types of Nanowires --- p.69 / Chapter 5.3.6 --- Effect of Growth Temperature --- p.71 / Chapter 5.4 --- Quality of the Nanowires --- p.72 / Chapter 5.5 --- "Remarks of the AFM Experiments and the ""Transferred"" Samples" --- p.72 / Chapter Chapter 6 - --- Conclusions --- p.75 / Appendices --- p.77 / Chapter I - --- "Estimation of the mass, other than the nanowires, contributed to the sample" --- p.77 / Chapter II - --- Calculation of the growth angle with respect to the surface normal --- p.78 / References --- p.80

by Lai Yiu Wai. / Thesis (M.Phil.)--Chinese University of Hong Kong, 2005. / Includes bibliographical references. / Abstract in English and Chinese. / Abstract / Abstract (Chinese) / Table of Contents / List of Figures / List of Tables / Chapter Chapter 1 --- Introduction / Chapter 1.1 --- Overview --- p.1-1 / Chapter 1.2 --- Conventional recording --- p.1-2 / Chapter 1.3 --- Superparamagnetism --- p.1-2 / Chapter 1.4 --- Possible solutions --- p.1-4 / Chapter 1.4.1 --- Perpendicular recording --- p.1-5 / Chapter 1.4.2 --- Patterned media --- p.1-6 / Chapter 1.4.3 --- High Ku material for recording media --- p.1-7 / Chapter 1.5 --- FePt-based material research 1 - --- p.1-8 / Chapter 1.6 --- Project goal --- p.1-11 / Reference --- p.1-12 / Chapter Chapter 2 --- Sample preparation and characterization techniques / Chapter 2.1 --- Pulsed filtered vacuum arc deposition (PFVAD) --- p.2-1 / Chapter 2.1.1 --- Sample preparation --- p.2-4 / Chapter 2.2 --- Rutherford backscattering spectroscopy (RBS) --- p.2-4 / Chapter 2.3 --- X-ray diffraction (XRD) --- p.2-6 / Chapter 2.4 --- Vibrating sample magnetometery (VSM) --- p.2-7 / Chapter 2.5 --- Transmission electron microscopy (TEM) --- p.2-9 / Reference --- p.2-10 / Chapter Chapter 3 --- Characterization of FePt-C nanocomposite thin film / Chapter 3.1 --- Experiment design --- p.3-1 / Chapter 3.2 --- Experiment detail --- p.3-1 / Chapter 3.3 --- Results and discussion --- p.3-3 / Chapter 3.3.1 --- NRBS measurements --- p.3-3 / Chapter 3.3.2 --- XRD measurements --- p.3-8 / Chapter 3.3.3 --- VSM measurements --- p.3-14 / Chapter 3.3.4 --- Some preliminary results on effects of post- deposition implantation --- p.3-23 / Chapter 3.3.5 --- TEM images --- p.3-26 / Chapter 3.3.6 --- Overall discussion --- p.3-29 / Chapter 3.3.6.1 --- Total film thickness effect --- p.3-29 / Chapter 3.3.6.2 --- Degree of ordering from XRD (001)/(002) peak intensity ratio --- p.3-33 / Chapter 3.3.6.3 --- C spacer thickness effect --- p.3-34 / Chapter 3.3.6.4 --- Implantation effect --- p.3-35 / Chapter 3.4 --- Summary --- p.3-35 / Reference --- p.3-36 / Chapter Chapter 4 --- Characterization of FePt-Cu nanocomposite thin film / Chapter 4.1 --- Experiment design --- p.4-1 / Chapter 4.2 --- Experiment detail --- p.4-1 / Chapter 4.3 --- Results and discussion --- p.4-3 / Chapter 4.3.1 --- RBS measurements --- p.4-3 / Chapter 4.3.2 --- XRD measurements --- p.4-7 / Chapter 4.3.3 --- VSM measurements --- p.4-9 / Chapter 4.3.4 --- Discussion --- p.4-12 / Chapter 4.3.4.1 --- Total film thickness effect --- p.4-12 / Chapter 4.3.4.2 --- Cu spacer thickness effect --- p.4-13 / Chapter 4.4 --- FePt films without additive --- p.4-16 / Chapter 4.5 --- Summary --- p.4-17 / Reference --- p.4-18 / Chapter Chapter 5 --- Conclusion and future works / Chapter 5.1 --- Conclusion --- p.5-1 / Chapter 5.2 --- Future works --- p.5-3 / Reference --- p.5-4 / Appendix 1 / Appendix 2

by Gao Yun. / "November 2002." / Thesis (Ph.D.)--Chinese University of Hong Kong, 2002. / Includes bibliographical references (p. 165-171). / Electronic reproduction. Hong Kong : Chinese University of Hong Kong, [2012] System requirements: Adobe Acrobat Reader. Available via World Wide Web. / Mode of access: World Wide Web. / Abstracts in English and Chinese.