231 |
Spektroskopické studium dohasínajících výbojů v dusíku a jeho směsích / Spectroscopic Study of Post-Discharges in Nitrogen and its MixturesMazánková, Věra January 2009 (has links)
Presented thesis gives results obtained during the spectroscopic observations of post –discharges of the pure nitrogen plasma with small oxygen admixture and in the nitrogen – argon mixture and the effect of the pink afterglow in it. The DC discharge in the flowing regime has been used for the plasma generation. The decaying plasma was study by optical emission spectroscopy, mainly in the range of 300–800 nm. The first positive, second positive, first negative nitrogen spectral system and NO spectral systems were observed in measured spectra. The band head intensities of these bands have been studied in the dependencies on experimental conditions. Simultaneously, the relative vibrational populations on the given nitrogen states have been calculated. Two discharge tubes made from different materials (PYREX glass and QUARTZ glass) were used in the case of nitrogen plasma containing low oxygen traces (up to 0.2 %). These experiments have been carried out at two wall temperatures for the determination of the temperature effect on the post-discharge. The discharge tube around the observation point was kept at the ambient temperature (300 K) or it was cooled down to 77 K by liquid nitrogen vapor. The total gas pressure of 1 000 Pa and the discharge current of 200 mA were conserved for all these experiments. The relative populations of electronic states were calculated in the dependence on the post-discharge time. The dependencies on oxygen concentration were given, too. The results showed no simple dependence of vibrational populations on oxygen concentration. Generally, slight increase of neutral nitrogen states populations was observed with the increase of oxygen concentration. These observations were well visible due to the intensity of nitrogen pink afterglow effect that was well visible at all oxygen concentrations. The pink afterglow maximal intensity was reached at about 5–10 ms at the wall temperature of 300 K in the PYREX tube. The molecular ion emission was strongly quenched by the oxygen and as this was dominant process for the pink afterglow emission the pink afterglow effect disappears at oxygen concentration of about 2000 ppm. The temperature and wall material influences were observed, too. The post-discharge in nitrogen argon mixtures was studied only in the PYREX tube at the ambient wall temperature of 300 K. The power dissipated in an active discharge was constant of 290 kW. The experimental studies had two new parameters – total gas pressure (500 Pa – 5 000 Pa) and the argon concentrations that were varied in the range of 0–83 %. Also in this case the dependencies of relative intensities of the bands given above were obtained and further the relative populations of electronic states as a function of decay time, total gas pressure and on argon concentration were obtained. The pink afterglow effect was observed at all applied discharge powers and total gas pressures. At the highest argon concentrations, especially at lower pressure, the pink afterglow effect disappeared. The presented experimental work is one of the hugest sets of experiments in the nitrogen with oxygen traces and in nitrogen-argon mixtures. These data can be used as a very good fundament for the further studies using wide numeric modeling of the post-discharge kinetic processes.
|
232 |
Istraživanja kompleksnih oblika spektralnih linija berilijuma u prisustvu berilijumske prašine / Investigation of complex shapes of beryllium spectral lines in the presence of beryllium dustStankov Biljana 03 August 2020 (has links)
<p>Opisani su detalji konstrukcije novog izvora plazme, u impulsnom režimu, konstruisanog za potrebe ekscitacija linija berilijuma u prisustvu berilijumske prašine. Konstrukcija izvora je ostvarena na takav način da je sprečeno prodiranje čestica prašine u atmosferu laboratorije. Opisane su dodatne 2 cevi za pražnjenje konstruisane od Al2O3 i SiO 2 . Pronađeni su i opisani optimalni uslovi za rad<br />izvora plazme. Vrednosti elektronske koncentracije, određene nakon maksimuma<br />struje, korišćenjem vodonikove balmer beta linije, kreću se u opsegu 1,16-9,2 ∙10<br />22 m -3 . Elektronska temperatura je određena na osnovu relativnih intenziteta linija dva uzastopna jonizaciona stanja istog elementa i kreće se u opsegu 10 500-15 500 K. Prikazane su snimljene linije berilijuma, osim rezonantnih. Dato je poređenje snimljenih linija sa postojećim teorisjkim podacima. Dve linije berilijuma koje se pojavljuju sa zabranjenom komponentom su prikazane prvi put. Pokazano je da postoji tipičan trend zavisnosti odnosa dozvoljene i zabranjene komponente, kao i rastojanja između položaja maksimuma intenziteta ove dve komponente, od elektronske koncentracije, koji se javlja kod linija sa zabranjenim komponentama, što govori o<br />mogućnosti ove linije za primenu u dijagnostici plazme.</p> / <p>Construction details of new plasma source, running in pulsed regime, for beryllium spectral line studies, in the presence of beryllium dust particles are presented. The construction of the source was realised in such a way that it prevented the ingress of dust particles into the laboratory atmospher. Construction details and<br />testing of BeO discharge tube in comparison with SiO2 and Al2O3 discharge tubes are presented, also. Optimal conditions for plasma source operation and beryllium line studies are found. The electron density measured after discharge current maximum is determined from the peak separation of the hydrogen Balmer beta<br />spectral line, and the electron temperature is determined from the ratios of the relative intensities of Be spectral lines emitted from successive ionized stages of atoms. Maximum values of electron density and temperature are measured to be 9.3∙1022 m -3 and 16 800 K, respectively. The recorded spectral lines of beryllium, other then resonant lines, are presented. The lines with forbidden component are described for the first time. The functional dependence of the wavelength separation range and peak intensity ratio of these lines upon<br />electron number density suggests the complex profile of the forbidden and allowed line, which can be used for diagnostics of low-temperature beryllium containing plasmas.</p>
|
233 |
Laser-Induced Breakdown Spectroscopy: Simultaneous Multi-Elemental Analysis and Geological ApplicationsSanghapi, Herve Keng-ne 06 May 2017 (has links)
Under high irradiation, a fourth state of matter named plasma can be obtained. Plasmas emit electromagnetic radiation that can be recorded in the form of spectra for spectroscopic elemental analysis. With the advent of lasers in the 1960s, spectroscopists realized that lasers could be used simultaneously as a source of energy and excitation to create plasmas. The use of a laser to ignite a plasma subsequently led to laser-induced breakdown spectroscopy (LIBS), an optical emission spectroscopy capable of analyzing samples in various states (solids, liquids, gases) with minimal sample preparation, rapid feedback, and endowed with in situ capability. In this dissertation, studies of LIBS for multi-elemental analysis and geological applications are reported. LIBS was applied to cosmetic powders for elemental analysis, screening and classification based on the raw material used. Principal component analysis (PCA) and internal standardization were used. The intensity ratios of Mg/Si and Fe/Si observed in talcum powder show that these two ratios could be used as indicators of the potential presence of asbestos. The feasibility of LIBS for the analysis of gasification slags was investigated and results compared with those of inductively-coupled plasma−optical emission spectrometry (ICP-OES). The limits of detection for Al, Ca, Fe, Si and V were determined. The matrix effect was studied using an internal standard and PLS-R. Apart from V, prediction results were closed to those of ICP-OES with accuracy within 10%. Elemental characterization of outcrop geological samples from the Marcellus Shale Formation was also carried out. The matrix effect was substantially reduced. The limits of detection obtained for Si, Al, Ti, Mg, Ca and C were determined. The relative errors of LIBS measurements are in the range of 1.7 to 12.6%. Gate delay and laser pulse energy, have been investigated in view of quantitative analysis of variation of trace elements in a high-pressure environment. Optimization of these parameters permits obtaining underwater plasma emission of calcium with quantitative results on the order of 30 ppm within a certain limit of increased pressure. Monitoring the variation of the trace elements can predict changes in the chemical composition in carbon sequestration reservoir.
|
234 |
kfowee_disseration_upload.pdfKatherine L F Gasaway (14226848) 07 December 2022 (has links)
<p>As the small satellite market has grown from a niche of the space economy to a full commercial force, microthrusters remain an area of significant growth in the space industry as new technologies mature. The \textit{Film-Evaporation Microelectricalmechanical Tunable Array} (FEMTA) is one such device. FEMTA is \textit{microelectricalmechanical system} (MEMS) device that harnesses the microcapillary action of water and vacuum boiling to generate thrust. The water propellant is not chemically altered at all by the process; it is simply evaporated. This technology has been tested in relevant laboratory environments, and a suborbital flight opportunity in 2023 as a payload on a Blue Origin New Shepard rocket will grant FEMTA a demonstration in a space environment. The flight will provide 150 seconds of weightlessness at the zenith of the suborbital flight path before the booster returns to land. During weightlessness, the experiment will be exposed to the ambient environment allowing for a full capability test of the thruster. The experiment is meant to demonstrate the propellant management system for FEMTA in 0G and measure the thrust produced by a FEMTA thruster.</p>
<p><br></p>
<p>The propellant management system portion of the experiment consists of an oversized version of the subsystem intended for use in the thruster. The propellant management system uses a hydrofluoroether to inflate a diaphragm to ensure constant wetting of the propellant tank exit and nozzle inlet. The experiment will take tank pressure data and flow sensor data to understand the system's behavior. The system is duplicated for redundancy and to double the possible data. This system requires further testing before being prepared for launch, vibrational testing, thermal testing, and vacuum testing. </p>
<p><br></p>
<p>The 0G thrust experiment and plume analysis portion of the experiment consists of numerical modeling and a novel thrust measurement approach. \textit{Direct Simulation Monte Carlo} (DSMC) is being applied to understand the pressure, density, and temperature distributions of the plume of water vapor produced by the FEMTA thruster. The FEMTA nozzle environment is challenging to simulate with computational fluid dynamics or DSMC due to chaotic transient effects and because both the continuum and molecular regimes must be considered. The current analysis consisted of a two-dimensional model and investigated the effect of meniscus location and contact angle on thrust generated.</p>
<p><br></p>
<p>It is not possible to use traditional thrust measurement devices (sensitive torsional thrust stands or microsensors intended for use on small satellites) for microthrusters on a rocket booster. Two novel approaches for performing thrust measurement in the range of 100 microNewtons have been investigated. The first approach ionizes the FEMTA thruster plume and analyzes the plasma by optical emission spectroscopy. The theory states that the relative intensity of a given wavelength observed correlates to the density of the species in the plasma. The density of water would be directly correlated to the thrust generated by FEMTA during the experiment, as more water is evaporated as thrust is increased. This method is no longer being considered for the suborbital experiment but did yield promising results. </p>
<p><br></p>
<p>The second approach employs a d'Arsonval meter, a photo-interrupt, and an Arduino controller. The d'Arsonval meter consists of a stationary permanent magnet with a moving coil and a pointer. Increasing the voltage in the coil causes a torque on the system due to the magnetic field induced by the permanent magnet. This torque causes a deflection of the pointer that is proportional to the voltage applied. The flag of the sensor will be placed in the path of the gas jet from the thruster. The force caused by the jet pressure will move the flag. An Arduino controller will vary the voltage to hold the flag in place. As the mass flow rate increases, the reaction force required to hold the flag in place will increase. This sensor can be calibrated using an analog cold gas system that passes various gases (air nitrogen, argon, etc.) through an orifice nozzle at mass flow rates that are set by a mass flow rate controller. DSMC analysis has been performed to understand the flow field and flow properties and how they directly relate to the force experienced by the flag sensor. </p>
<p>An undergraduate course has supported parts of the work described in this dissertation. This course has applied the Vertically Integrated Projects approach to project-based learning. This method and its results were analyzed and lessons learned as well as a blueprint for future application of this method to other small satellite projects are discussed.</p>
|
235 |
Synthesis, Characterization and Photophysical Studies of Porphyrin and N-Confused Porphyrin Derivatives and Self-assembled Nano-MorphologiesAcharya, Rajendra 19 August 2013 (has links)
No description available.
|
236 |
Ultrafast Emission Spectroscopy and Nonlinear Laser Diagnostics for Nanosecond Pulsed PlasmasKarna S Patel (9380432) 24 April 2024 (has links)
<p dir="ltr">In recent years, nanosecond repetitively pulsed (NRP) plasma discharges have garnered significant interest due to their rapid generation of reactive excited-state species, reactive radicals, and localized heat release within nanosecond (ns) timescale. To effectively harness these plasmas for altering system-level thermal and chemical behavior, a thorough understanding of their governing physics is crucial. This knowledge enables the development of predictive plasma kinetic models for tailoring NRP plasmas to specific applications. However, achieving this requires high-fidelity experimental data to validate models and deepen our understanding of fundamental plasma physics. Advancing experimental spectroscopy and laser diagnostics methods is essential for probing such temporally highly dynamic and optically complex nonequilibrium environments. This includes developing novel <i>test platforms</i>, conducting <i>fundamental research</i> to address existing knowledge gaps, and constructing custom <i>ultrafast laser architectures</i> for probing plasma properties. </p><p dir="ltr">The pioneering development of Streak-based <i>test platform</i> in the diagnostics field of nanosecond pulsed plasmas and its successful application towards inferring the underlying ultrafast spatio-temporal evolution of nanosecond pulsed plasma discharges with an unprecedented time-resolution as short as ~25 ps is presented for the first time. Spectrally filtered, 1D line-imaging of nanosecond pulsed plasma discharges in a single-shot, jitter-free, continuously sweeping manner is obtained, and differences in discharge dynamics of air and N2 plasma environments are studied. Successive <i>test platform</i> advancement includes spectrally resolved Streak-spectroscopy measurements of thermal regime-transition evolution from early-nonequilibrium to local-thermal-equilibrium (LTE) to attain time-resolved quantitative insights into N2(C) state rotational/vibrational nonequilibrium temperatures, electron temperature/density, and spectral lifetime dynamics. </p><p dir="ltr">Ultrafast laser-based progression includes detailed <i>fundamental</i> investigation of higher-order optical nonlinearity perturbations of fs-EFISH by considering of – self-phase modulation induced spectral characteristic of fs-EFISH signal, calibration mapping during-below-and-beyond optical breakdown regime, optical Kerr effect consequences, impact of femtosecond (fs) laser seeding on the noninvasiveness of fs-EFISH, and spectral emission characteristics of fs laser filaments. To infer N2(X) state nonequilibrium of NRP pulsed plasmas, two hybrid fs/ps ro-vibrational coherent anti-Stokes Raman scattering (CARS) <i>ultrafast laser architectures</i> are developed. First architecture, single-laser-solution, reduces system’s energy budget by ~3 mJ/pulse for generating narrowband (~21 ps), high-energy (~420 μJ/pulse), 532 nm probe pulses through incorporation of custom built visible fs optical parametric amplifier (OPA) coupled with an Nd:YAG power amplifier module. The second architecture, two-laser-solution, improves system’s robustness through the development of a 1 kHz, 532 nm, high-energy (~600 μJ/pulse), low-jitter (<1 ps), narrowband (~27 ps), master-oscillator-power-amplification (MOPA) based picosecond probe pulse laser time-synchronized with fs master-oscillator. Single-shot, hybrid fs/ps narrowband ro-vibrational CARS demonstration in a combusting flame up to temperatures of ~2400 K is demonstrated. Experimental ro-vibrational CARS investigation includes polarization based nonresonant background suppression and demonstration of preferential Raman coherence excitation shift, a temperature sensitivity enhancing strategy for vibrationally hot mediums like nanosecond pulsed plasmas. Lastly, an ultrafast pulse-friendly optically accessible vacuum cell is designed and fabricated for controlled experiments of NRP fs/ps CARS. Special care is taken to prevent self-focusing and spectral-temporal chirp of fs CARS beams while maintaining Gaussian focusing beam caustic.</p>
|
237 |
Entwicklung und Charakterisierung einer Elektron-Zyklotron-Resonanz-Ionenquelle mit integriertem Sputtermagnetron für die Erzeugung intensiver Ströme einfach geladener AluminiumionenWeichsel, Tim 12 July 2016 (has links) (PDF)
Es wurde eine Elektron-Zyklotron-Resonanz-Ionenquelle mit einer Mikrowellenfrequenz von2,45 GHz für die Produktion intensiver Ströme einfach geladener Metallionen entwickelt. Deren Beladung mit Metalldampf erfolgt über ein integriertes zylindrisches Sputtermagnetron, welches speziell für diese Aufgabe entworfen wurde. Die entstandene MECRIS, engl. Magnetron Electron Cyclotron Resonance Ion Source, vereinigt die ECR-Ionenquellentechnologie mit der Magnetron-Sputtertechnologie auf bisher einzigartige Weise und verkörpert so ein neues Metallionen-Quellenkonzept. Unter Verwendung eines Al-Sputtertargets konnte die Funktionsfähigkeit der MECRIS an dem Beispiel der Al+-Ionenerzeugung erfolgreich demonstriert werden. Der extrahierbare Al+-Ionenstrom wurde über einen neuartigen, im Rahmen der Arbeit entwickelten, Hochstrom-Faraday-Cup gemessen.
Auf Basis numerischer Berechnungen wurde das Gesamtmagnetfeld so ausgelegt, dass die Permanentmagnete des Magnetrons und die Spulen der ECR-Quelle eine Minimum-B-Struktur erzeugen, welche einen effektiven Elektroneneinschluss nach dem magnetischen Spiegelprinzip ermöglicht. Gleichzeitig wird durch eine geschlossene ECR-Fläche, mit der magnetischen Resonanzflussdichte von 87,5 mT, eine optimale Heizung der Plasmaelektronen realisiert. Die mithilfe einer Doppel-Langmuir-Sonde gemessene Elektronentemperatur steigt in Richtung Quellenmitte an und beträgt maximal 11 eV. Geheizte Elektronen erlauben die effiziente Stoßionisation der Al-Atome, welche mit einer Rate von über 1E18 Al-Atome/s eingespeist werden und eine höchstmögliche Dichte von 2E10 1/cm³ aufweisen.
Die MECRIS erzeugt hauptsächlich einfach geladene Ionen des gesputterten Materials (Al+) und des Prozessgases (Ar+). Der Al+-Ionenextraktionsstrom ist über die Erhöhung der Prozessparameter Sputterleistung, Mikrowellenleistung, Spulenstrom und Extraktionsspannung um eine Größenordnung bis auf maximal 135 μA steigerbar, was einer Stromdichte von 270 μA/cm² über die Extraktionsfläche von rund 0,5 cm² entspricht. Dies steht im Einklang mit der Prozessparameterabhängigkeit der anhand der Sonde bestimmten Plasmadichte, welche einen größtmöglichen Wert von etwa 6E11 1/cm³ annimmt. Das Verhältnis von extrahiertem Al+- zu Ar+-Ionenstrom kann durch Optimierung der Prozessparameter von 0,3 auf maximal 2 angehoben werden.
Sondenmessungen des entsprechenden Ionendichteverhältnisses bestätigen diesen Sachverhalt. Um möglichst große Extraktionsströme und Al+/Ar+-Verhältnisse zu generieren, muss die ECR-Fläche demnach in dem Bereich der höchsten Al-Atomdichte in der Targetebene lokalisiert sein. Gegenüber dem alleinigen Magnetronplasma (ohne Mikrowelleneinspeisung) können mit dem MECRIS-Plasma um bis zu 140 % höhere Al+-Ionenströme produziert werden. Aus Sondenuntersuchungen geht hervor, dass dies eine Folge der um etwa eine Größenordnung gesteigerten Plasmadichte und der um rund 7 eV größeren Elektronentemperatur des MECRIS-Plasmas ist.
Das MECRIS-Plasma wurde außerdem mittels optischer Emissionsspektroskopie charakterisiert und durch ein globales sowie ein zweidimensionales Modell simuliert. Die gewonnenen Prozessparameterabhängigkeiten der Plasmadichte, Elektronentemperatur sowie Al+- und Ar+-Ionendichte stimmen mit den Sondenergebnissen überein. Teilweise treten jedoch Absolutwertunterschiede von bis zu zwei Größenordnungen auf.
Die Erhöhung der Sputterleistung und Extraktionsspannung über die derzeitigen Grenzen von 10 kW bzw. 30 kV sowie die Optimierung der Extraktionseinheit hinsichtlich minimaler Elektrodenblindströme bietet das Potential, den Al+-Ionenstrom bis in den mA-Bereich zu steigern. / An electron cyclotron resonance ion source working at a microwave frequency of 2.45 GHz has been developed in order to generate an intense current of singly charged metal ions. It is loaded with metal vapor by an integrated cylindrical sputter magnetron, which was especially designed for this purpose. The MECRIS (Magnetron Electron Cyclotron Resonance Ion Source) merges ECR ion source technology with sputter magnetron technology in a unique manner representing a new metal ion source concept. By using an Al sputter target, the efficiency of the MECRIS was demonstrated successfully for the example of Al+ ion production. The extractable ion current was measured by a newly developed high-current Faraday cup.
On the basis of numerical modeling, the total magnetic field was set in a way that the permanent magnets of the magnetron and the coils of the ECR source are forming a minimum-B-structure, providing an effective electron trap by the magnetic mirror principle.
Simultaneously, optimal electron heating is achieved by a closed ECR-surface at resonant magnetic flux density of 87.5 mT. Electron temperature increases towards the center of the source to a maximum of about 11 eV and was measured by a double Langmuir probe. Due to the heated electron population, efficient electron impact ionization of the Al atoms is accomplished. Al atoms are injected with a rate of more than 1E18 Al-atoms/s resulting in a maximum Al atom density of 2E10 1/cm³.
The MECRIS produces mainly singly charged ions of the sputtered material (Al+) and the process gas (Ar+). The Al+ ion extraction current is elevated by one order of magnitude to a maximum of 135 μA by increasing the process parameters sputter magnetron power, microwave power, coil current, and acceleration voltage. Related to the extraction area of about 0.5 cm², the highest possible Al+ ion current density is 270 μA/cm². A corresponding process parameter dependency was found for the plasma density showing a peak value of about 6E11 1/cm³, which was deduced from probe measurements. The ratio of the extracted Al+ ion current to the Ar+ ion current can be enhanced from 0.3 to a maximum of 2 by optimization of the process parameters. This was confirmed by probe investigations of the appropriate ion density ratio. In conclusion, the ECR-surface needs to be located in the area of the highest Al atom density in the target plane in order to improve the extraction current and Al+/Ar+ ratio.
The MECRIS plasma produces an Al+ ion current, which is up to 140 % higher compared to that of the sole sputter magnetron plasma (without microwave injection). As revealed by probe measurements, this effect is due to the higher plasma density and electron temperature of the MECRIS plasma, leading to a difference of one order of magnitude and 7 eV, respectively.
Additionally, the MECRIS plasma has been characterized by optical emission spectroscopy and simulated by a global and a two-dimensional model. Retrieved process parameter dependencies of plasma density, electron temperature, Al+ ion density, and Ar+ ion density coincide with probe findings. Although a discrepancy of the absolute values of partly up to two orders of magnitude is evident.
Potentially, the Al+ ion current can be enhanced to the mA-region by optimizing the ion extraction system for minimal idle electrode currents and by rising sputter magnetron power as well as acceleration voltage above the actual limits of 10 kW and 30 kV, respectively.
|
238 |
Εγκατάσταση και μελέτη αντιδραστήρα τεχνολογικού πλάσματος ραδιοσυχνοτήτων για εφαρμογές στη νανοτεχνολογίαΚονισπολιάτης, Χρήστος 13 October 2013 (has links)
Μια από τις σημαντικότερες τεχνικές εγχάραξης σε μίκρο και νάνο-κλίμακα είναι αυτή της ξηρής εγχάραξης με πλάσμα. Η παρούσα εργασία είχε σαν σκοπό την κατασκευή διάταξης επεξεργασίας ψυχρού πλάσματος χαμηλής πίεσης που να λειτουργεί στο πεδίο των ραδιοσυχνοτήτων, με την προοπτική να χρησιμοποιηθεί για την επεξεργασία πολυμερών και άλλων υλικών που χρησιμοποιούνται στις μονώσεις υψηλών τάσεων ώστε να βελτιωθούν διάφορες ιδιότητές τους όπως η επιφανειακή υδροφοβία και η αντοχή στη ρύπανση. Ειδικότερα:
Στο πρώτο κεφάλαιο γίνεται εισαγωγή του αναγνώστη στην επεξεργασία πλάσματος και συγκεκριμένα στην εγχάραξη και τους φυσικούς και χημικούς μηχανισμούς της. Αναλύεται η διάταξη RIE, η οποία εφαρμόζεται κατά την κατασκευή του συστήματος.
Στο δεύτερο κεφάλαιο περιγράφεται ο σχεδιασμός και η κατασκευή της διάταξης επεξεργασίας, η οποία αποτελείτε από διακριτά μέρη όπως οι θάλαμοι, το πνευματικό σύστημα, το αντλητικό σύστημα και το σύστημα τροφοδοσίας της ισχύος. Δόθηκε ιδιαίτερη προσοχή στη λεπτομερή περιγραφή του κάθε εξαρτήματος που ενσωματώθηκε και ο εξειδικευμένος ρόλος του, ενώ τα αναλυτικά κατασκευαστικά σχέδια παρατίθενται στο παράρτημα.
Στο τρίτο κεφάλαιο γίνεται βασικός χαρακτηρισμός του αντιδραστήρα. Δηλαδή, παρουσιάζονται οι ηλεκτρικές μετρήσεις οι οποίες ταυτίζονται με τη βιβλιογραφία, παρουσιάζονται οπτικές μετρήσεις από τις οποίες γίνεται ταυτοποίηση ενεργών σωματίων, τα οποία επίσης είναι σύμφωνα με τη βιβλιογραφία παρόμοιων συστημάτων και τέλος, γίνεται ενδεικτική επεξεργασία πολυμερούς και έλεγχος του αποτελέσματος, το οποίο είναι η πιστή απόδοση μοτίβου και ρυθμός εγχάραξης 30nm/min.
Στο τέταρτο και τελευταίο κεφάλαιο προτείνονται μελλοντικές εργασίες και βελτιώσεις. / One of the most prominent etching techniques at micro and nano-scale is dry plasma etching. This work’s purpose was the fabrication of a cold plasma low pressure radio-frequency processing rig, with the prospect of being used for polymer and other materials processing, that are used in high voltage insulators, in order to improve their surface properties such as hydrophobicity and pollution resistance. In particular;
In the first chapter the reader is being introduced in plasma processing and in particular in etching and physical and chemical mechanisms. RIE set-up, which is to be applied in our rig, is being analyzed.
In the second chapter the design and fabrication of the processing rig are being described, which includes parts like the chambers, the pneumatic system, the pumping system and the power delivery system. Special care has been given for a detailed description of every added component and its specialized role, while their analytical mechanical designs are collocated in the appendix.
In the third chapter a basic characterization of the reactor is being delivered. Namely, we present electrical measurements which correspond precisely to bibliography and we also present optical measurements from which identification of reactive species is derived, also in accordance to bibliography. Finally, a polymeric substrate is indicatively processed and the result is the faithful pattern transfer by an etching rate of 30nm/min.
In the fourth and last chapter, suggestions for future work and improvements are made.
|
239 |
Modification des propriétés optiques de nanofils à base de GaN par plasma N2/O2Ferreira, Jason 07 1900 (has links)
Une sonde électrostatique de Langmuir cylindrique a été utilisée pour caractériser une post-décharge d’un plasma d’ondes de surface de N2-O2 par la mesure de la densité des ions et électrons ainsi que la température des électrons dérivée de la fonction de distribution en énergie des électrons (EEDF). Une densité maximale des électrons au centre de la early afterglow de l’ordre de 1013 m-3 a été déterminée, alors que celle-ci a chuté à 1011 m-3 au début de la late afterglow. Tout au long du profil de la post-décharge, une densité des ions supérieure à celle des électrons indique la présence d’un milieu non macroscopiquement neutre. La post-décharge est caractérisée par une EEDF quasi maxwellienne avec une température des électrons de 0.5±0.1 eV, alors qu’elle grimpe à 1.1 ±0.2 eV dans la early afterglow due à la contribution des collisions vibrationnelles-électroniques (V-E) particulièrement importantes. L’ajout d’O2 dans la décharge principale entraîne un rehaussement des espèces chargées et de la température des électrons suivi d’une chute avec l’augmentation de la concentration d’O2. Le changement de la composition électrique de la post-décharge par la création de NO+ au détriment des ions N2+ est à l’origine du phénomène. Le recours à cette post-décharge de N2 pour la modification des propriétés d’émission optique de nanofils purs de GaN et avec des inclusions d’InGaN a été étudié par photoluminescence (PL). Bien que l’émission provenant des nanofils de GaN et de la matrice de GaN recouvrant les inclusions diminue suite à la création de sites de recombinaison non radiatifs, celle provenant des inclusions d’InGaN augmente fortement. Des mesures de PL par excitation indiquent que cet effet n’est pas attribuable à un changement de l’absorption de la surface de GaN. Ceci suggère un recuit dynamique induit par la désexcitation des métastables de N2 suite à leur collision à la surface des nanofils et la possibilité de passiver les défauts de surface tels que des lacunes d’azote par l’action d’atomes de N2 réactifs provenant de la post-décharge. L’incorporation d’O2 induit les mêmes effets en plus d’un décalage vers le rouge de la bande d’émission des inclusions, suggérant l’action des espèces d’O2 au sein même des nanostructures. / A cylindrical electrostatic Langmuir probe was used to characterize the flowing afterglow of a N2-O2 surface wave plasma. The spatial distribution of the number density of positive and electrons as well as the EEDF were measured. A maximum of the number density of electrons in the mid 1013 m-3 was obtained in the center of the early afterglow, while it decreased at 1011 m-3 early in the late afterglow, thus indicating non-macroscopically neutral media all along the flowing afterglow. It is characterized by an EEDF close to a Maxwellian with an electron temperature of 0.5±0.1 eV, while it increased at 1.1±0.2 eV in the early afterglow due to the contribution of important vibration-electron collisions. After addition of small amounts of O2 in the main N2 microwave discharge, the charged particles densities and electron temperature first strongly increased then decreased with increasing O2 concentration. A change in the charged population in the afterglow by the creation of NO+ to the detriment of the N2+ ions is responsible of this phenomenon. This N2 flowing afterglow was later used for plasma-induced modification of pure GaN nanowires and InGaN/GaN dot-in-a-wire heterostructures and characterized by PL. While the band edge emission from GaN nanowires and the GaN matrix of the InGaN/GaN nanowires strongly decreased due to the creation of non-radiative recombination centers in the near-surface region, the emission from the InGaN inclusions strongly increased. PL excitation measurements show that this increase cannot be explained by a plasma-induced shift of the GaN absorption edge. Instead a dynamical annealing process induced by the desexcitation of N2 metastables following their collision with the nanowire surface and the passivation of surface defects such as nitrogen vacancies by the highly reactive nitrogen atoms in the afterglow are responsible of the increase of the PL intensity. The addition of O2 gives the same results as the pure N2 treatment, but a redshift of the emission band related to the InGaN inclusions is also observed, suggesting an important contribution of the oxygen species.
|
240 |
Étude de l'influence de la réassociation en surface des atomes N et O sur l'inactivation des spores bactériennes dans une post-décharge N2-O2 basse pression en fluxCarignan, Denis 01 1900 (has links)
Le recours au plasma pour stériliser des dispositifs médicaux (DM) est un domaine de recherche ne datant véritablement que de la fin des années 1990. Les plasmas permettent, dans les conditions adéquates, de réaliser la stérilisation à basse température (≤ 65°C), tel qu’exigé par la présence de polymères dans les DM et ce contrairement aux procédés par chaleur, et aussi de façon non toxique, contrairement aux procédés chimiques comme, par exemple, l’oxyde d’éthylène (OEt). Les laboratoires du Groupe de physique des plasmas à l’Université de Montréal travaillent à l’élaboration d’un stérilisateur consistant plus particulièrement à employer les effluents d’une décharge N2-%O2 basse pression (2-8 Torrs) en flux, formant ce que l’on appelle une post-décharge en flux. Ce sont les atomes N et O de cette décharge qui viendront, dans les conditions appropriées, entrer en collisions dans la chambre de stérilisation pour y créer des molécules excitées NO*, engendrant ainsi l’émission d’une quantité appréciable de photons UV. Ceux-ci constituent, dans le cas présent, l’agent biocide qui va s’attaquer directement au bagage génétique du micro-organisme (bactéries, virus) que l’on souhaite inactiver. L’utilisation d’une lointaine post-décharge évite du même coup la présence des agents érosifs de la décharge, comme les ions et les métastables. L’un des problèmes de cette méthode de stérilisation est la réduction du nombre de molécules NO* créées par suite de la perte des atomes N et O, qui sont des radicaux connus pour interagir avec les surfaces, sur les parois des matériaux des DM que l’on souhaite stériliser. L’objectif principal de notre travail est de déterminer l’influence d’une telle perte en surface, dite aussi réassociation en surface, par l’introduction de matériaux comme le Téflon, l’acier inoxydable, l’aluminium et le cuivre sur le taux d’inactivation des spores bactériennes. Nous nous attendons à ce que la réassociation en surface de ces atomes occasionne ainsi une diminution de l’intensité UV et subséquemment, une réduction du taux d’inactivation.
Par spectroscopie optique d’émission (SOE), nous avons déterminé les concentrations perdues de N et de O par la présence des matériaux dans le stérilisateur, ainsi que la diminution de l’émission UV en découlant. Nous avons observé que cette diminution des concentrations atomiques est d’autant plus importante que les surfaces sont catalytiques. Au cours de l’étude du phénomène de pertes sur les parois pour un mélange N2-%O2 nous avons constaté l’existence d’une compétition en surface entre les atomes N et O, dans laquelle les atomes d’oxygènes semblent dominer largement. Cela implique qu’au-delà d’un certain %O2 ajouté à la décharge N2, seuls les atomes O se réassocient en surface. Par ailleurs, l’analyse des courbes de survie bi-phasiques des micro-organismes a permis d’établir une étroite corrélation, par lien de cause à effet, entre la consommation des atomes N et O en surface et la diminution du taux d’inactivation des spores dans la première phase. En revanche, nous avons constaté que notre principal agent biocide (le rayonnement ultraviolet) est moins efficace dans la deuxième phase et, par conséquent, il n’a pas été possible d’établir un lien entre la diminution des concentrations et le taux d’inactivation de cette phase-là. / The use of plasmas to sterilize medical devices (MDs) is a research field, which really started only at the end of the 90’s. Plasmas under adequate conditions allow achieving low-temperature (≤ 65°C) sterilization, as required by MDs made from polymers, in contrast to heat-driven sterilization methods, and provide a non-toxic method, in contrast to chemical processes such as performed, for example, with ethylene oxide (EtO). The Groupe de physique des plasmas laboratories at Université de Montréal is working on the design and testing of a sterilizer, which has the peculiarity of utilizing the species outflowing from a N2-%O2 discharge at reduced pressure (2-8 Torrs), which is called a plasma flowing-afterglow. It is the N and O atoms of this discharge mixture that, under appropriate conditions, interact in the sterilization chamber to form NO* excited molecules, generating a significant level of UV photons. These are, in the present case, the actual biocidal agent which will create lethal lesions on the genetic material of the microorganisms (bacteria, viruses) that should be inactivated. Using a flowing late afterglow instead of the discharge itself enables us to avoid the presence of the erosive agents of the discharge (ions, metastable-state particles). A major problem of this sterilization method is the reduction in the concentration of NO* molecules resulting from the losses of the N and O atoms on the surfaces of the MD materials that we want to sterilize. These radicals are, in fact, well-known to interact with surfaces and recombine on them. The main aim of our work is to determine the loss level of such atoms following their surface recombination on materials such as Teflon, stainless steel, aluminum and copper and the corresponding influence of such losses on the inactivation rate of bacterial spores. We can expect that surface recombination of these atoms leads to a reduction in the UV emission intensity and, as a result, in a reduction in the inactivation rate.
Using optical emission spectroscopy (OES), we have determined the loss of N and O concentrations resulting from the presence of various materials in the sterilizer chamber as well as the corresponding decrease in UV emission intensity. We have observed that this reduction in atomic concentrations increases with the catalytic properties (recombination coefficient) of these materials. While examining the surface recombination phenomenon on these various materials, we have noticed a competition between the surface recombination of N and O atoms where the latter appear to play the main role. This implies that above a certain percentage of O2 added to N2, only the O atoms do recombine on these surfaces. On the other hand, the analysis of the bi-phasic survivor curves has enable us to show a strong correlation between the consumption of N and O atoms on surfaces and the reduction in the inactivation rate coefficient in the first phase of the survivor curve. We have also observed that our main biocidal agent is less efficient in the second phase of the survivor curve and, as a result, it was not possible to make a connection between the reduction in N and O atom concentration and the inactivation rate of the second phase.
|
Page generated in 0.0381 seconds