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Work function tuning of reactively sputtered MoxSiyNz metal gate electrodes for advanced CMOS technologyPatel, Pommy 14 July 2008 (has links)
Due to continued transistor scaling, work function tuning of metal gates has become important for advanced CMOS applications. Specifically, this research has been undertaken to discover the tuning of the MoxSiyNz gate work function through the incorporation of nitrogen. Metal Oxide Semiconductor (MOS) capacitors were fabricated using thermal SiO2 as gate oxide on lightly doped p-type Si wafer. A molybdenum silicide (MoSi2) target was reactively sputtered at 10mTorr in presence of N2 and Ar. The gas flow ratio, RN = N2/ (N2+Ar), was adjusted to vary the nitrogen concentration in MoSiN films. The gate work function (Фm) was extracted from capacitance-voltage (CV) measurements using the VFB-tox method. Interfacial barrier heights were measured using internal photoemission (IPE) as an independent confirmation of the MoSiN gate work function. The work function was found to decrease linearly (from ~4.7eV to ~4.4eV) for increasing gas flow ratios (from 10% to 40%). Secondary ion mass spectrometry (SIMS) depth profiles suggested that the nitrogen concentration was relatively uniform throughout the film. X-Ray Photoelectron Spectroscopy (XPS) surface analysis showed a steady increase in the total nitrogen concentration (from ~20% to 32%) in these films as gas flow ratio was increased. These data suggests that the increase in nitrogen concentration in MoSiN films corresponds directly with the lowering of MoSiN work function. These results clearly demonstrate that the work function of MoxSiyNz can be varied ~0.3 eV by adjusting the nitrogen concentration.
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Multi-axis milling of flexible parts /Abrari, Farid. January 1998 (has links)
Thesis (Ph.D.) -- McMaster University, 1998. / Includes bibliographical references (p. 149-156). Also available via World Wide Web.
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Helical tool geometry in stability predictions and dynamic modeling of millingEdes, Benjamin T. January 2007 (has links)
Thesis (M.S.)--University of Missouri-Columbia, 2007. / The entire dissertation/thesis text is included in the research.pdf file; the official abstract appears in the short.pdf file (which also appears in the research.pdf); a non-technical general description, or public abstract, appears in the public.pdf file. Title from title screen of research.pdf file (viewed on April 9, 2009) Includes bibliographical references.
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Modelling air flow in die casting /Xie, Guangping, January 1900 (has links)
Thesis (M.App.Sc.) - Carleton University, 2002. / Includes bibliographical references (p. 102-104). Also available in electronic format on the Internet.
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Computer aided design of dies for cold drawing processesKartik, Ramanan. January 1995 (has links)
Thesis (M.S.)--Ohio University, November, 1995. / Title from PDF t.p.
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Various combinations of fibers and anodized aluminium /Jung, In-Won. January 1990 (has links)
Thesis (M.F.A.)--Rochester Institute of Technology, 1990. / Typescript. Includes bibliographical references (leaf 50).
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Aggression and symbols of power /Kuhn, Karen. January 1990 (has links)
Thesis (M.F.A.)--Rochester Institute of Technology, 1990. / Typescript. Includes bibliographical references.
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Motion in metal /Wolk, Lisa C. January 1990 (has links)
Thesis (M.F.A.)--Rochester Institute of Technology, 1990. / Typescript. Includes bibliographical references (leaves 26-27).
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An integrated computer simulation system to evaluate surface integrity in end milling /Choi, Young Gu, January 1996 (has links)
Thesis (Ph. D.)--University of Missouri-Columbia, 1996. / Typescript. Vita. Includes bibliographical references (leaves 134-139). Also available on the Internet.
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An integrated computer simulation system to evaluate surface integrity in end millingChoi, Young Gu, January 1996 (has links)
Thesis (Ph. D.)--University of Missouri-Columbia, 1996. / Typescript. Vita. Includes bibliographical references (leaves 134-139). Also available on the Internet.
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