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Thermomechanical property evaluation of molybdenum alloysVaradarajan, Ashok, January 2004 (has links)
Thesis (M.S.)--West Virginia University, 2004. / Title from document title page. Document formatted into pages; contains ix, 76 p. : ill. (some col.). Vita. Includes abstract. Includes bibliographical references (p. 73-75).
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Microstructure evaluations and thermomechanical properties of spinel (MgAl₂O₄) dispersed molybdenum alloysLee, Chee Kiat. January 2005 (has links)
Thesis (M.S.)--West Virginia University, 2005. / Title from document title page. Document formatted into pages; contains vii, 42 p. : ill. (some col.). Includes abstract. Includes bibliographical references (p. 40-42).
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Thermomechanical properties of molybdenum alloys with dispersing MgAl204 (spinel) and MgO particlesSun, Dongxiang. January 2003 (has links)
Thesis (M.S.)--West Virginia University, 2003. / Title from document title page. Document formatted into pages; contains viii, 53 p. : ill. (some col.) Includes abstract. Includes bibliographical references (p. 51-53).
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The preparation of ferromolybdenum by the silico-thermal reduction of calcium molybdateWilligman, Melvin George, 1913- January 1939 (has links)
No description available.
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The strengthening effect of ordered precipitates in a Ni-Ni^;b4^;sMo system.Goodrum, John Wesley 08 1900 (has links)
No description available.
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The electrodeposition of molybdenum alloys from aqueous solutionsErnst, Donald Warren, January 1956 (has links)
Thesis (Ph. D.)--University of Wisconsin--Madison, 1956. / Typescript. Vita. eContent provider-neutral record in process. Description based on print version record. Includes bibliographical references (leaves 148-150).
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Radiation effects in molybdenum and molybdenum-zirconium alloyLiou, Kang-Yih. January 1979 (has links)
Thesis--University of Wisconsin--Madison. / Typescript. Vita. eContent provider-neutral record in process. Description based on print version record. Includes bibliographical references (leaves 188-196).
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Growth, structure, and electronic properties of molybdenum/silicon thin films by Molecular beam epitaxy (MBE).Shapiro, Arye. January 1989 (has links)
Mo-Si thin films have proven applications in semiconductor devices and x-ray optics. Since their performance in these applications is extremely sensitive to interface roughness, it is important to understand the nucleation and growth mechanisms which affect the microscopic interface structure. Investigations of the initial stages of interface formation in the Mo-Si system were carried out by depositing fractional-monolayer Mo films onto Si(100)-(2x1) and Si(111)-(7x7) surfaces using Molecular Beam Epitaxy (MBE) with feedbackcontrolled electron-beam evaporation, and by characterizing these ultra-thin Mo films using in situ Reflection High-Energy Electron Diffraction (RHEED), LowEnergy Electron Diffraction (LEED), Auger Electron Spectroscopy (AES), and xray Photoelectron Spectroscopy (XPS). Continuous growth of multiple Mo coverages on a single Si wafer was accomplished with a technique developed for these experiments, involving a moveable substrate shutter. The coverages were corrected for the deposition profile (due to growth chamber geometry) with ex situ Rutherford Backscattering Spectroscopy (RBS) data and computer modelling. The growth mode was determined using Auger intensity measurements. In order to correct for the time dependence of the Auger intensities due to trace surface contamination and instrumental drift, a technique was developed which used Auger measurements on bulk Si and Mo to further normalize the intensity data for the fractional-monolayer coverages of Mo. The AES results in this dissertation show that for relatively slow Mo deposition (i.e. rates of approximately 0.05 Angstroms per second) onto either (100) or (111) Si substrates maintained at low temperatures (i.e. 100 °C), the first atomic monolayer of Mo is deposited in a non-layer-by-layer fashion, implying interdiffusion and/or agglomeration of the Mo overlayer. The LEED and RHEED results on similar samples show that the Mo layer is non-crystalline, i.e. there is no long-range periodicity. In addition, the deposition of Mo destroys the periodicity of the underlying Si atoms. For these deposition conditions, both the growth mode and the lack of crystallinity are independent of Si surface crystal structure.
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A FIELD-EMISSION MICROSCOPE INVESTIGATION OF THE EFFECTS OF AMBIENT ATMOSPHERES ON THE STRESS-CORROSION CRACKING OF URANIUM - MOLYBDENUM ALLOYSSulsona, Herman, 1940- January 1968 (has links)
No description available.
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Short range order and development of long range order in nickel - 20 atomic percent molybdenum alloyChakravarti, Bhaven 08 1900 (has links)
No description available.
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