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Development of a technique to measure ink tackPatel, Navnit. January 1985 (has links)
No description available.
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The rheological properties of letterpress and lithographic inks /Pangalos, George C. January 1983 (has links)
No description available.
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High-Throughput Transfer Imprinting for Organic SemiconductorsChoo, Gihoon 16 December 2013 (has links)
Development of nanoimprint lithography(NIL) has enabled high-throughput and high-resolution patterning over the optical limitation. In recent years, thermal nanoimprint has been used to directly pattern functional materials such as organic semiconductors because heat and pressure used in thermal nanoimprint do not damage functional materials. However, issues such as residual layer removal and mold contamination still limit the application of nanoimprint for organic semiconductor patterning.
In this work, nanoimprint-based transfer imprinting of organic semiconductor is studied. In the same time the suggested technique is simulated with COMSOL multi-physics simulator to understand its mechanism. This transfer printing technique utilize thermal nanoimprint scheme to enable residual-layer-free patterning of organic semiconductors without mold contamination. The transfer imprinting technique is amenable to roll-to-roll process for high-throughput patterning of organic semiconductors for low-cost organic electronic applications.
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Synthesis and characterization of polyesters for use as binders in textile printingLan, Tian January 1996 (has links)
No description available.
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Studies on toner properties and fabric performance properties for xerographic textile printingWang, Lejun January 1996 (has links)
No description available.
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Interfacial studies on xerographic textile printsShi, Songhua 12 1900 (has links)
No description available.
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Xerographic printing of textilesFailor, Brian Jay 05 1900 (has links)
No description available.
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Surface-directed patterning of polymer/nanoparticle assemblies on microcontact-printed substratesHarirchian-Saei, Saman 18 January 2012 (has links)
Two different strategies for producing hierarchical polymer/nanoparticle (NP) patterned structures are presented in this work. The first strategy combines self-assembly of amphiphilic block copolymers at the air-water interface with microscale template assembly of the resulting aggregates on chemically-patterned substrates. Aggregates are formed via interfacial self-assembly of 141k polystyrene-block-poly (ethylene oxide) (PS-b-PEO, Mw=141 k) or a blend of PS-b-PEO (Mw=185 k) and PS-coated CdS (PS-CdS) quantum dots (QDs), to form aggregates of copolymer or copolymer/NP. Using Langmuir-Blodgett (LB) technique, the formed aggregates are then transferred to patterned substrates with alternating hydrophilic/hydrophobic stripes, obtained by microcontact printing (µCP) octadecyltrichlorosilane (OTS) on glass. The effect of different parameters including surface pressure, orientation of the patterned substrate respect to the air-water interface, and withdrawal speed was studied. Successful aggregate transfer to the hydrophilic domains of the patterned hydrophilic/hydrophobic substrate is achieved when patterned stripes are oriented perpendicular to the water surface during LB transfer and when substrates are withdrawn at low speed and low compression pressure.
The second strategy combines the phase-separation of immiscible polymer blends during spin-coating with µCP. We show the surface-directed patterning of a phase-separating polymer blend on optically-transparent (OTS)-patterned glass substrate obtained via µCP. First, morphologies and pattern registration of thin spin-coated films of PS (Mw=131 k)/ poly(methyl methacrylate) (PMMA, Mw= 120 k) blends on patterned glass with alternating hydrophilic/hydrophobic stripes is studied for a range of experimental conditions including polymer concentration, blend composition, solvent, and spin rate. Good registration of polar PMMA to hydrophilic glass surface and non-polar PS to hydrophobic OTS lines is found under conditions, where polymer domain sizes are commensurate with the pattern periodicity. Next, we apply this method to pattern NPs using blends of PMMA and PS-CdS QDs via spin-coating onto OTS-patterned glass. Ultimately the method was extended to simultaneously pattern multi-NP functional assemblies using PS-CdS and a sample of PMMA-coated silver NP (PMMA-Ag). The specific interest in patterns of Ag NPs and CdS QDs is to provide a suitable proof-of-concept system for simultaneous multi-NP patterning. However, this system also has some interesting optical behaviour as a result of QD-surface plasmon interactions that is investigated in details. The challenge in PS-CdS/PMMA-Ag NPs patterning is the gelation as the solvent evaporates during spin-coating that restricts the NPs mobility and constraints their phase-separation. We show that adding homopolymers to the NPs blends prevents the overlap of approaching NP brushes and prevents the resulting gelation. Feature sizes were then fine-tuned by changing solution concentration and spin rate, in order to obtain NPs domains which can be surface-directed on OTS-patterned glass substrates. / Graduate
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Photochemical rearrangements and thermal decompositions applicable to novel lithographic materialsDowd, Sharon January 1998 (has links)
No description available.
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A study of the figure in intaglioBirch, Hannah L. January 2005 (has links)
This project chronicles my explorations of the human figure in intaglio and relief printmaking and in the medium of artists' books. I had very little experience in the field of printmaking prior to my acceptance into the Masters program at Ball State University. I found intaglio, or etching into a metal plate, stimulating and exciting because there are very few limitations in terms of what I can do with this medium. I received a Bachelors of Fine Arts in drawing from SUNY Fredonia. Creating artwork in the printmaking medium has allowed my drawing skills to continue to grow and provided a variety of new technical possibilities. I choose to work with the figure because it is an important subject for an artist to study in order to learn to draw. Since all humans share the same basic structure, it is something that everyone should relate to. It is also something that translates into every possible medium, from cave drawings to fashion design. Many of the artists I have studied, such as Albrecht Durer, and Francisco Goya, worked with the figure in printmaking. Their work provided inspiration while I pursued my own work in this field. / Department of Art
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