This master´s thesis deals with an examination of different solution types a for the chemical passivation of a silicon surface. Various solutions are tested on silicon wafers for their consequent comparison. The main purpose of this work is to find optimal solution, which suits the requirements of a time stability and start-up velocity of passivation, reproducibility of the measurements and a possibility of a perfect cleaning of a passivating solution remainig from a silicon surface, so that the parameters of a measured silicon wafer will not worsen and there will not be any contamination of the other wafers series in the production after a repetitive return of the measured wafer into the production process. The cleaning process itself is also a subject of a development.

The reactivity and bonding of an ethinyl-functionalized cyclooctyne on Si(001) is studied by means of density functional theory. This system is promising for the organic functionalization of semiconductors. Singly bonded adsorption structures are obtained by [2 + 2] cycloaddition reactions of the cyclooctyne or ethinyl group with the Si(001) surface. A thermodynamic preference for adsorption with the cyclooctyne group in the on-top position is found and traced back to minimal structural deformation of the adsorbate and surface with the help of energy decomposition analysis for extended systems (pEDA). Starting from singly bonded structures, a plethora of reaction paths describing conformer changes and consecutive reactions with the surface are discussed. Strongly exothermic and exergonic reactions to doubly bonded structures are presented, while small reaction barriers highlight the high reactivity of the studied organic molecule on the Si(001) surface. Dynamic aspects of the competitive bonding of the functional groups are addressed by ab initio molecular dynamics calculations. Several trajectories for the doubly bonded structures are obtained in agreement with calculations using the nudged elastic band approach. However, our findings disagree with the experimental observations of selective adsorption by the cyclooctyne moiety, which is critically discussed.

Die zwei Chelatbildner für Schwermetallionen, Carboxymethylthio- (CMT) und Piperazinyl- (PPz), wurden erfolgreich über die direkte kathodische Elektroreduktion ihres Aryl diazoniumsalzes auf Wasserstoff–terminiertes Silizium (Si-H)- und auf Gold (Au)-Substratoberflächen aus den Derivaten: 4-(Carboxymethylthio)benzenediazoniumsalz [4-CMTBD]+BF4- und 4-(Piperazinyl)benzenediazoniumsalz [4-PPzBD]+BF4- abgeschieden. Die elektrochemische Anbindung wurde unter Verwendung von zyklischer Voltammetrie (CV) und chronoamperometrie (CA) Techniken durchgeführt. Die IRSE-Spektren bestätigten die Anwesenheit der organischen CMT- und PPz-Komplexbildnergruppen durch ihre charakteristischen Absorptionsbanden auf den elektrotransplantierten Si(111) - und Au-Substraten, was eine erfolgreiche Oberflächenfunktionalisierung anzeigt. Die Analyse, der bei der chronoamperometrischen Elektroreduktion gemessenen Ströme, der beiden Diazoniumkationen [4-CMTBD]+ und [4-PPzBD]+ sowohl auf Si (111)-H- als auch auf Au-Oberfläche, zeigt eine Korrelation mit der kinetischen Reaktionsgleichung zweiter Ordnung während der frühen Stufen der jeweiligen elektrochemischen Deposition. Die Behandlung der funktionalisierten Oberflächen, Si(4-CMTB) mit Cu- und Pb- Ionen, und Si(4-PPzB) mit Cu-Ionen unter niedrigen hydrothermalen Druckbedingungen führte zur Bildung von organometallischen Chelatkomplexen auf den Oberflächen. Die Aufnahme von Cu-Ionen sowohl auf der Si(4-CMTB)- als auch auf der Si(4-PPzB)-Oberfläche wurde ebenfalls mittels XPS untersucht. Die Schwermetallionen-chelatisierenden Nanokompositoberflächen, die in dieser Arbeit erfolgreich hergestellt und charakterisiert wurden, stellen neuartige funktionelle Materialien dar, die potentiell technische Interesse haben könnten. / The two heavy-metal-ion (HMI) chelating groups, carboxymethylthio- (CMT), and piperazinyl- (PPz), were successfully electrografted on Si(111)-H and Au substrate surfaces via the direct cathodic electroreduction of their aryl diazonium salt derivatives: the 4-(carboxymethylthio)benzenediazonium salt [4-CMTBD]+BF4-, and the 4-(piperazinyl)benzenediazonium salt [4-PPzBD]+BF4-. The IRSE spectra confirmed the successful surface functionalization by the CMT and PPz chelating groups by their characteristic absorption bands on the electrografted Si(111) and Au substrates. The analysis of the chronoamperometric electroreduction of the two diazonium cations [4-CMTBD]+ and [4-PPzBD]+, on both Si(111)-H and Au surfaces, revealed that the rate of decay in currents correlates with the second-order kinetic rate law during the early stages of the electrografting reactions. The treatment of the functionalized surfaces, Si-(4-CMTB) with the Cu and Pb ions, and Si-(4-PPzB) with Cu ions under low pressure hydrothermal conditions led to the formation of organometallic chelate complexes on the surfaces. The uptake of Cu ions on both the Si-(4-CMTB) and Si-(4-PPzB) surfaces was also elucidated by XPS measurements. The HMI chelating nanocomposite surfaces successfully fabricated and characterized in this work constitute novel functional materials that may be of potential engineering interests.