Made available in DSpace on 2014-06-11T19:30:18Z (GMT). No. of bitstreams: 0 Previous issue date: 2012-02-24Bitstream added on 2014-06-13T18:40:19Z : No. of bitstreams: 1 schiaber_zs_me_bauru.pdf: 1292517 bytes, checksum: a77a9460815db1ad11c8b75efaad7290 (MD5) / Coordenação de Aperfeiçoamento de Pessoal de Nível Superior (CAPES) / Semicondutores de gap largo são materiais de grande interesse devido às suas amplas aplicações tecnológicas. Entre os semicondutores de gap largo se destaca o GaN que apresenta características desejáveis para tais aplicações, como valor de energia de bandgap de 3,4 eV, alta condutividade térmica e alta dureza. As técnicas convencionais para a produção de filmes finos de GaN são a epitaxia por feixe molecular (MBE) e deposição de vapor químico de precursores metalorgânicos (MOVPE), porém tais técnicas possuem um elevado custo. Este trabalho discorre sobre a preparação e caracterização de filmes policristalinos de GaN pela técnica alternativa de RF magnetron sputtering reativo com diferentes temperaturas e tipos de substratos. Analisou-se o efeito da variação destes dois parâmetros sobre estrutura e propriedades ópticas destes filmes. Utilizou-se medidas de difração de raios-X, microscopia de força atômica, transmitância no ultravioleta/visível/infravermelho e espectroscopia de espalhamento Rutherford (RBS). As medidas realizadas reportaram que tanto a temperatura quanto o tipo de substrato influenciaram na textura de orientação, morfologia e propriedades ópticas dos filmes. Medidas de transmitância no infravermelho indicaram a presença de bandas relacionadas à contaminação com higrogênio e oxigênio em filmes depositados em temperaturas de substratos menores que 500ºC. As referidas contaminações são compatíveis com a análise residual da água detectada no sistema de deposições, e não foram observadas em temperaturas maiores de substrato. Os diafratogramas de raios-X revelaram que somente em temperaturas altas (Ts>500ºC) a textura de orientação dos filmes é influenciada pelo substrato utilizado, podendo apresentar indícios de crescimento epitaxial. As medidas... / Wide bandgap semiconductor materials are of great interest due to the broad range of their technological applications. Among the wide bandgap semiconductor GaN stands out due to its desirable characteristics for such aplications as the value of energy bandgap of 3.4 eV, high thermal conductivity and high hardness. Conventional techniques for producing GaN thin films are the molecular beam epitaxy (MBE) and chemical vapor deposition of metalorganinc precursors (MOVPE), nevertheless these are high techniques. This work brings into focus the preparation and characterization of polycrystalline GaN films by the alternative technique of reactive RF magnetron sputtering with different temperatures and substrates. The effects of varying theses two parameters on structured and optical properties of these films were analysed. Therefore, X-ray diffraction, atomic force microscopy, optical transmittance in the ultraviolet/visible/infrared, and Rutherford Backscattering Spectrometry (RBS) were used to characterize the samples. The results show that temperature, substrate type, and substrate orientation influence the texture, morphology and optical properties of the films. The X-ray diffraction patterns revealed that the orientation texture of films is influenced by the substrate used only at high substrate temperature (Ts>500ºC). This evidences a tendency of epitaxial growth. Besides, the atomic force microscopy at temperature above 500ºC showed that the surface morphology is different for amorphous and crystalline substrates. It also became evident that the decrease of deposition rate and bandgap of the films with increasing deposition temperature is possibly due to nitrogen deficiency by the high rate of desorption at these temperatures. In addition, measurements of trasmisttanc in the infrared Fourier Transform indicated the presence... (Complete abstract click electronic access below)

published_or_final_version / abstract / Electrical and Electronic Engineering / Doctoral / Doctor of Philosophy

Thesis (Ph. D.)--Ohio State University, 2006. / Title from first page of PDF file. Includes bibliographical references (p. 232-237).

Thesis (M.S.)--Mississippi State University. Department of Electrical and Computer Engineering. / Title from title screen. Includes bibliographical references.

Thesis (Ph.D)--Electrical and Computer Engineering, Georgia Institute of Technology, 2008. / Committee Chair: Honsberg, Christiana; Committee Co-Chair: Ferguson, Ian; Committee Member: Citrin, David; Committee Member: Klein, Benjamin; Committee Member: Rohatgi, Ajeet; Committee Member: Snyder, Robert. Part of the SMARTech Electronic Thesis and Dissertation Collection.

Wide band gap based nanostructures have being attracting much research interest because of their promise for application in optoelectronic devices. Among those wide band gap semiconductors, gallium nitride (GaN) and zinc oxide (ZnO) are the most commonly studied and optoelectronic devices based on GaN and ZnO have been widely investigated. This thesis concentrates on the growth, optical and electrical properties of GaN and ZnO nanostructures, plus their application in solar cells and light emitting diodes (LEDs). GaN-nanowire based dye sensitized solar cells were studied. Different post-growth treatments such as annealing and coating with a TiOx shell were applied to enhance dye absorption. It was found that TiOx increased the dye absorption and the performance of the dye sensitized solar cell. ZnO nanorods were synthesized by vapor deposition and electrodeposition. Post-growth treatments such as annealing and hydrothermal processing were used to modify the defect chemistry and optical properties. LEDs based on GaN/ZnO heterojunctions were studied. The influence of ZnO seed layers on GaN/ZnO LEDs was investigated. GaN/ZnO LEDs based on ZnO nanorods with MgO and TiOx shells were also prepared in order to modify the LED performance. The coating condition of the shell was found to influence the current-voltage (I-V) characteristics and device performance. Moreover, high brightness LEDs based on GaN with InGaN multiple quantum wells were also fabricated. The origin of the emission from GaN/ZnO LEDs was studied using different kinds of GaN substrates. Direct metal contacts on bare GaN substrates were also employed to investigate the optical emission and electrical properties. It is found that the emission from the GaN/ZnO LEDs probably originated from the GaN substrate. GaN/ZnO LEDs with MgO as an interlayer were also fabricated. The MgO layer was expected to modify the band alignment between the GaN and the ZnO. It was shown that GaN/MgO/ZnO heterojunctions (using both ZnO nanorods and ZnO films) have quite different emission performance under forward bias compared to those that have no MgO interlayer. An emission peak was around 400 nm could originate from ZnO. Nitrogen doped ZnO nanorods on n-type GaN have been prepared by electrodeposition. Zinc nitrate and zinc acetate were used as ZnO precursors and NH4NO3 was used as a nitrogen precursor. Only the ZnO nanorods made using zinc nitrate showed obvious evidence of doping and coherent I-V characteristics. Cerium doped ZnO based LEDs were fabricated and showed an emission that depended on the cerium precursor that was employed. This indicates that the choice of precursor influences the growth, the materials properties and the optical properties of ZnO. / published_or_final_version / Physics / Doctoral / Doctor of Philosophy

Thesis (Ph. D.)--Ohio University, 2001. / Title from PDF t.p.

Thesis (Ph. D.)--University of Hong Kong, 2007. / Title proper from title frame. Also available in printed format.

Thesis (M.S.)--West Virginia University, 1998. / Title from document title page. "December 1998." Document formatted into pages; contains viii, 125 p. : ill. (some col.). Includes abstract. Includes bibliographical references (p. 84-89).

Thesis (Ph. D.)--Oregon State University, 2010. / Printout. Includes bibliographical references. Also available on the World Wide Web.