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Characterisation of potassium tantalate niobate optical waveguides formed by ion implantation and surface studies of Nd YAG crystalsNunn, Patricia Jean Thomson January 2003 (has links)
No description available.
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ZnGa₂O₄ and ZnGa₂O₄:Mn²⁺ for potential use in vacuum fluorescent displays /Shea, Lauren Elizabeth, January 1993 (has links)
Thesis (M.S.)--Virginia Polytechnic Institute and State University, 1993. / Vita. Abstract. Includes bibliographical references (leaves 65-67). Also available via the Internet.
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Growth and Cathofoluminescence of Zns:Mn Thin FilmsBhise, Milind 01 1900 (has links)
A novel technique of incorporating dopants in a thin film was designed. It was successfully used to dope ZnS thin films with Mn. Cathodoluminescent (CL) properties of these Mn activated ZnS films were studied. For a constant accelerating potential and beam current density, the CL emission intensity was found to increase with Mn content up to -2 wt% Mn. A further increase in the Mn content lead to a decrease in the CL intensity. The optimum Mn content is different than that for electroluminescence (-0.7 wt%) and photoluminescence (-1.6 wt%). Emission spectra of ZnS:Mn with a higher Mn content (> 1.64 wt%) show an additional red band besides the usual 580 nm yellow band. The relative intensity of the red band to the yellow band increases with the Mn content. The phenomenon of concentration quenching and the red emission seem to be interrelated; an attempt has been made to explain the physical basis behind these phenomena. Coverage of rough ceramic substrates by ZnS thin films deposited by vacuum evaporation and atomic layer epitaxy (ALE) has been investigated. The results suggest a uniform coverage in the case of ALE deposited films, while those deposited by vacuum evaporation show a shadowing effect. / Thesis / Master of Engineering (ME)
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Cathodoluminescence of ion-implanted ZnSeAbolhassani, N. January 1985 (has links)
No description available.
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Morphological and cathodoluminescence studies of ZnSe quasi-one-dimensional nanostructures. / 硒化鋅准一維納米結構的形貌和陰極射線致發光的研究 / Morphological and cathodoluminescence studies of ZnSe quasi-one-dimensional nanostructures. / Xi hua xin zhun yi wei na mi jie gou de xing mao he yin ji she xian zhi fa guang de yan jiuJanuary 2004 (has links)
Liu Zhuang = 硒化鋅准一維納米結構的形貌和陰極射線致發光的研究 / 劉壯. / Thesis (M.Phil.)--Chinese University of Hong Kong, 2004. / Includes bibliographical references (leaves 60-63). / Text in English; abstracts in English and Chinese. / Liu Zhuang = Xi hua xin zhun yi wei na mi jie gou de xing mao he yin ji she xian zhi fa guang de yan jiu / Liu Zhuang. / ABSTRACT --- p.i / ACKNOWLEDGMENTS --- p.iii / TABLE OF CONTENTS --- p.iv / LIST OF TABLES --- p.vi / LIST OF FIGURES --- p.vii / Chapter 1. --- Introduction --- p.1 / Chapter 1.1 --- Synthesizing quasi one-dimensional nanostructures of ZnSe using MOCVD --- p.1 / Chapter 1.2 --- Well-aligned nanostructures and heterocrystalline nanorods --- p.2 / Chapter 1.3 --- Advantages of CL in studying nanostructures --- p.3 / Chapter 2. --- Experimental conditions and procedures --- p.7 / Chapter 2.1 --- Information on the samples --- p.7 / Chapter 2.2 --- SEM and CL setting --- p.9 / Chapter 2.3 --- CL calibration --- p.10 / Chapter 3. --- Experimental results and data analysis --- p.14 / Chapter 3.1 --- SEM results and discussion --- p.14 / Chapter 3.1.1 --- SEM studies helping to find the optimal growth condition --- p.14 / Chapter 3.1.2 --- Morphological studies --- p.18 / Chapter 3.1.3 --- The growth direction of well-aligned nanostructure --- p.22 / Chapter 3.1.4 --- Discussion of the growth mechanisms of the nanostructures based on the morphological studies --- p.28 / Chapter 3.2 --- CL results and discussion --- p.34 / Chapter 3.2.1 --- CL spectra of nanostructures of different morphologies --- p.34 / Chapter 3.2.2 --- CL images for studying of distribution of localized radiative centers --- p.40 / Chapter 3.2.3 --- CL studies of a single nanorod --- p.44 / Chapter 3.2.3.1 --- Room temperature CL studies of a single nanorod --- p.44 / Chapter 3.2.3.2 --- Liquid Helium temperature (4.5 K) CL studies of a single nanorod --- p.50 / Chapter 4. --- Conclusions --- p.59 / Reference --- p.60
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Cathodoluminescence of gallium nitride /Campo, Eva M., January 2003 (has links)
Thesis (Ph. D.)--Lehigh University, 2003. / Includes bibliographical references and vita.
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Cathodoluminescence from II-VI quantum well light emitting diodes /Nikiforov, Alexey. January 2003 (has links)
Thesis (Ph. D.)--Lehigh University, 2003. / Includes vita. Includes bibliographical references (leaves 162-172).
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Second order luminescent saturation effects in phosphorsManigault, Patrick Alexander 05 1900 (has links)
No description available.
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Transport Imaging developing an optical technique to characterize bulk semiconductor materials for next generation radiation detectors /Catalano, Sarah L. January 2009 (has links) (PDF)
Thesis (M.S. in Physics)--Naval Postgraduate School, June 2009. / Thesis Advisor(s): Haegel, Nancy M. "June 2009." Description based on title screen as viewed on July 10, 2009. Author(s) subject terms: Cathodoluminescence, Diffusion, Drift, Mobility, Lifetime, Bismuth Ferrite, BiFeO3 , Semiconductor, Transport Imaging. Includes bibliographical references (p. 61-62). Also available in print.
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The effect of short term anneals on the cathodoluminescence of GaAsThird, Christine Elizabeth January 1990 (has links)
This study examines the effect of furnace annealing and rapid thermal annealing (RTA) on the room-temperature cathodoluminescence (CL) image of liquid encapsulated Czochralski (LEC) GaAs substrates. Furnace annealed samples were heated in a tube furnace for 20 minutes at temperatures from 600 to 950 °C. RTA annealed samples were heated in a commercial RTA furnace for 5 s at temperatures from 650 to 950 °C. The times used for both methods are typical of those used for post-ion implantation annealing although selected samples were RTA annealed at times from 10 to 160 s. The temperature range examined has been extended beyond typical post-ion implantation anneal temperatures to investigate the effect of temperature on the substrate. Examination of RTA annealed GaAs using CL has not been reported previous to this investigation.
The CL images of the annealed samples are compared with those of the as-received (un-annealed) material. The CL images of the LEC GaAs wafers prior to annealing have dark spots which correspond to the location of dislocations with regions of higher CL intensity surrounding them. These regions of higher CL intensity are referred to as 'halos'. The remaining material has a CL intensity lower than these halos. The dislocations in LEC GaAs form into cellular networks to reduce the strain energy in the crystal. When viewed at low magnification the overlap of the halos makes the cell walls appear bright and the cell interiors appear dark in a CL image.
The furnace annealed substrates show an increase in CL intensity in the interior of the cells. The halos are still present at the cell walls but a region of low CL intensity persists outside the halos making the cell walls appear dark with a brighter interior. This behaviour was seen in all the furnace annealed material although the contrast decreases with increasing anneal temperature.
The RTA anneal samples show similar behaviour to the furnace annealed samples at temperatures below 800 °C. Above this temperature the halos are no longer noticeable in the surface CL images, although the region of lower CL intensity can be seen along some cell walls. When a cleaved cross-section is examined using CL, there are regions of higher CL intensity adjacent to both surfaces. These regions typically extend from 100 to 200 μm in from the surface and are nearly uniform in depth. The centre region of the sample appeared the same as the as-received material with dislocation spots, surrounding halos and low CL intensity in the interiors of the cells.
The bright regions seen in the cross-section CL images of the RTA samples were examined using photoluminescence at liquid helium temperatures. This investigation found a correlation between the bright regions and the presence of Cu. In addition, the amount of residual Cu on the surface has a significant affect on the depth of the bright bands. Low residual Cu levels results in shallower band depths than high residual Cu levels. It is proposed that the presence of the Cu acts to increase the recombination rate thus increasing the brightness of the CL image. / Applied Science, Faculty of / Materials Engineering, Department of / Graduate
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