Electrical properties of thin film have been an issue of interest for a long time and there are many applications in contemporary industry. Interesting characteristics, such as a metal-insulator transition and superconductivity, were investigated and applied to manufacturing of various electrical devices. In this line of study, many experimental techniques have been introduced for precise measurement of the properties of thin film. Quench-condensation is one of the important techniques in the research of thin films. To facilitate this research, we built a quench-condensation apparatus which can be used for a variety of experiments. The apparatus was designed for the fabrication of ultra-thin film and the in-situ measurement at low temperature. The apparatus was shown to operate well for the fabrication of thin films while monitoring the growth in-situ. As a part of the preliminary research, we measured the electrical properties of aluminum thin films at liquid nitrogen temperature by using this apparatus. An investigation of the thickness dependent conduction properties was successively performed in-situ. Experimental data showed agreement with theory, in particular the electrical conduction model of Neugebaur and Webb.

Electrical properties of thin film have been an issue of interest for a long time and there are many applications in contemporary industry. Interesting characteristics, such as a metal-insulator transition and superconductivity, were investigated and applied to manufacturing of various electrical devices. In this line of study, many experimental techniques have been introduced for precise measurement of the properties of thin film. Quench-condensation is one of the important techniques in the research of thin films. To facilitate this research, we built a quench-condensation apparatus which can be used for a variety of experiments. The apparatus was designed for the fabrication of ultra-thin film and the in-situ measurement at low temperature. The apparatus was shown to operate well for the fabrication of thin films while monitoring the growth in-situ. As a part of the preliminary research, we measured the electrical properties of aluminum thin films at liquid nitrogen temperature by using this apparatus. An investigation of the thickness dependent conduction properties was successively performed in-situ. Experimental data showed agreement with theory, in particular the electrical conduction model of Neugebaur and Webb.