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Yes / This work integrates a harmonic tuning mechanism in synergy with the GaN HEMT transistor for 5G mobile transceiver applications. Following a theoretical study on the operational behavior of the Class-F power amplifier (PA), a complete amplifier design procedure is described that includes the proposed Harmonic Control Circuits for the second and third harmonics and optimum loading conditions for phase shifting of the drain current and voltage waveforms. The performance improvement provided by the Class-F configuration is validated by comparing the experimental and simulated results. The designed 10W Class-F PA prototype provides a measured peak drain efficiency of 64.7% at 1dB compression point of the PA at 3.6GHz frequency.

The research of III-nitride wide-bandgap semiconductor devices, such as laser diodes (LDs), ultra-violet (UV) light-emitting diodes (LEDs), and high electron mobility transistors (HEMTs), has recently increased. Numerous opportunities exist for performance improvement in the wide bandgap semiconductor device structure, including material selection, compound compositions, polarization effects, and layer thicknesses. On the other hand, they can make optimization more challenging. It still takes a lot of resources to analyze and test complicated structures in a systematic manner. This dissertation creates a new path for device design by using TCAD and machine learning to deliver quick forecasts of III-nitride semiconductor device performance. The dissertation includes three major components. In Chapter 2, the TCAD-assisted HEMT device design is discussed. We demonstrate the performance improvement of using the new material BAlN as an interlayer in GaN/AlGaN HEMT devices and compare the various interlayer design alternatives for HEMTs. In chapter 3, we propose asymmetrical p-AlGaN/i-InGaN/n-AlGaN tunnel junctions (TJs) by combining machine learning (ML) with TCAD calculations. The resistances for 22254 various TJ structures were predicted by the model, which creates a tool for real-time TJ resistance prediction. Based on our TJ predictions, we proposed asymmetric TJ with higher Al content in the p-layer and lower TJ resistance. In Chapter 4, using the stacked XGBoost/LightGBM algorithm, we thoroughly examined the superlattice (SL) electron blocking layer (EBL) for AlGaN deep ultra-violet (DUV) LEDs. Based on the ML model, we suggest a low Al-content SL-EBL (1 nm/5 nm Al0.7Ga0.3N/Al0.58Ga0.42N) that is simpler, experimentally realizable and can greatly improve carrier transport. Additionally, we examine the prediction data and show how the composition and thickness affect the improvement of the IQE. The work contributes to the advancement of using SL-EBLs for high-efficiency DUV LEDs by providing methodical research on SL-EBLs. This dissertation presents novel approaches to the design of electrical and optical wide bandgap semiconductor devices, which opens up a new avenue for future research. It is possible that it might be used in a broad variety of fields, including illumination, sensing, disinfection, and power devices.

Modern RF and millimeter-wave communication links call for high-efficiency front end systems with high output power and high linearity to meet minimum transmission requirements. Advanced modulation techniques, such as orthogonal frequency-division multiplexing (OFDM) require a large power amplifier (PA) dynamic range due to the high peak-to-average power ratio (PAPR). This thesis provides the analysis, design, and experimental verification of a high-efficiency, high-linearity S-band Doherty power amplifier (DPA) based on the Class F PA. Traditional Class F PAs use harmonically tuned output matching networks to obtain up to 88.4% power-added efficiency (PAE) theoretically, however the amplifier experiences poor linearity performance due to switched mode operation, typically yielding less than 30dB C/I ratio [1]. The DPA overcomes this linearity limitation by using an auxiliary amplifier to boost output power when the amplifier is subject to a high input power due to its limited conduction cycle. The DPA also provides improved saturated output power back-off performance to maintain high PAE during operation. The DPA presented in this thesis optimizes PAE while maintaining linearity by employing harmonically tuned Class F amplifier topology on a primary and an auxiliary amplifier. A Class F PA is first designed and fabricated to optimize output network linearity – this is followed by a DPA design based on the fabricated Class F PA. A GaN HEMT Class F PA and DPA operating at 2.2GHz are implemented with the PAs measuring 40% and 45% PAE respectively while maintaining a 30dB carrier-to-intermodulation (C/I) ratio on a two-tone test. The PAE is characterized at maximum 21dBm input power per tone and 20MHz tone spacing. When subject to a single 24dBm continuous wave input tone, the Class F PA and DPA output 37dBm and 35.5dBm respectively. The PAs presented in the thesis provide over 30dB C/I ratio up to 21dBm input tones while maintaining over 40% PAE suitable for base station applications.

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As power conversion technology is being integrated further into high-reliability environments such as aerospace and electric vehicle applications, a full analysis and understanding of the system's robustness under operating conditions inside and outside the safe-operating-area is necessary. The robustness of power semiconductor devices, a primary component of power converters, has been traditionally evaluated through qualification tests that were developed for legacy silicon (Si) technologies. However, new devices have been commercialized using wide bandgap (WBG) semiconductors including silicon carbide (SiC) and gallium nitride (GaN). These new devices promise enhanced capabilities (e.g., higher switching speed, smaller die size, lower junction capacitances, and higher thermal conductance) over legacy Si devices, thus making the traditional qualification experiments ineffective. This work begins by introducing a new methodology for evaluating the switching robustness of SiC metal-oxide-semiconductor field-effect transistors (MOSFETs). Recent static acceleration tests have revealed that SiC MOSFETs can safely operate for thousands of hours at a blocking voltage higher than the rated voltage and near the avalanche boundary. This work evaluates the robustness of SiC MOSFETs under continuous, hard-switched, turn-off stresses with a dc-bias higher than the device rated voltage. Under these conditions, SiC MOSFETs show degradation in merely tens of hours at 25si{textdegree}C and tens of minutes at 100si{textdegree}C. Two independent degradation and failure mechanisms are unveiled, one present in the gate-oxide and the other in the bulk-semiconductor regions, detected by the increase in gate leakage current and drain leakage current, respectively. The second degradation mechanism has not been previously reported in the literature; it is found to be related to the electron hopping along the defects in semiconductors generated in the switching tests. The comparison with the static acceleration tests reveals that both degradation mechanisms correlate to the high-bias switching transients rather than the high-bias blocking states. The GaN high-electron-mobility transistor (HEMT) is a newer WBG device that is being increasingly adopted at an unprecedented rate. Different from SiC MOSFETs, GaN HEMTs have no avalanche capability and withstand the surge energy through capacitive charging, which often causes significant voltage overshoot up to their catastrophic limit. As a result, the dynamic breakdown voltage (BV) and transient overvoltage margin of GaN devices must be studied to fully evaluate the switching ruggedness of devices. This work characterizes the transient overvoltage capability and failure mechanisms of GaN HEMTs under hard-switched turn-off conditions at increasing temperatures, by using a clamped inductive switching circuit with a variable parasitic inductance. This test method allows flexible control over both the magnitude and the dV/dt of the transient overvoltage. The overvoltage robustness of two commercial enhancement-mode (E-mode) p-gate HEMTs was extensively studied: a hybrid drain gate injection transistor (HD-GIT) with an Ohmic-type gate and a Schottky p-Gate HEMT (SP-HEMT). The overvoltage failure of the two devices was found to be determined by the overvoltage magnitude rather than the dV/dt. The HD-GIT and the SP-HEMT were found to fail at a voltage overshoot magnitude that is higher than the breakdown voltage in the static current-voltage measurement. These single event failure tests were repeated at increasing temperatures (100si{textdegree}C and 150si{textdegree}C), and the failures of both devices were consistent with room temperature results. The two types of devices show different failure behaviors, and the underlying mechanisms (electron trapping) have been revealed by physics-based device simulations. Once this single-event overvoltage failure was established, the device's robustness under repetitive overvoltage and surge-energy events remained unclear; therefore, the switching robustness was evaluated for both the HD-GIT and SP-HEMT in a clamped, inductive switching circuit with a 400 V dc bias. A parasitic inductance was used to generate the overvoltage stress events with different overvoltage magnitude up to 95% of the device's destructive limit, different switching periods from 10 ms to 0.33 ms, different temperatures up to 150si{textdegree}C, and different negative gate biases. The electrical parameters of these devices were measured before and after 1 million stress cycles under varying conditions. The HD-GITs showed no failure or permanent degradation after 1-million overvoltage events at different switching periods, or elevated temperatures. The SP-HEMTs showed more pronounced parametric shifts after the 1 million cycles in the threshold voltage, on-resistance, and saturation drain current. Different shifts were also observed from stresses under different overvoltage magnitudes and are attributable to the trapping of the holes produced in impact ionization. All shifts were found to be recoverable after a relaxation period. Overall, the results from these switching-oriented robustness tests have shown that SiC MOSFETs show a tremendous lifetime under static dc-bias experiments, but when excited by hard-switching turn-off events, the failure mechanisms are accelerated. These results suggest the insufficient robustness of SiC MOSFETs under high bias, hard switching conditions, and the significance of using switching-based tests to evaluate the device robustness. These inspired the GaN-based hard-switching turn-off robustness experiments, which further demonstrated the dynamic breakdown voltage phenomena. Ultimately these results suggest that the breakdown voltage and overvoltage margin of GaN HEMTs in practical power switching can be significantly underestimated using the static breakdown voltage. Both sets of experiments provide further evidence for the need for switching-oriented robustness experiments to be implemented by both device vendors and users, to fully qualify and evaluate new power semiconductor transistors. / Doctor of Philosophy / Power conversion technology is being integrated into industrial and commercial applications with the increased use of laptops, server centers, electric vehicles, and solar and wind energy generation. Each of these converters requires the power semiconductor devices to convert energy reliably and safely. textcolor{black}{Silicon has been the primary material for these devices; however,} new devices have been commercialized from both silicon carbide (SiC) and gallium nitride (GaN) materials. Although these devices are required to undergo qualification testing, the standards were developed for silicon technology. The performance of these new devices offers many additional benefits such as physically smaller dimensions, greater power conversion efficiency, and higher thermal operating capabilities. To facilitate the increased integration of these devices into industrial applications, greater robustness and reliability analyses are required to supplement the traditional tests. The work presented here provides two new experimental methodologies to test the robustness of both SiC and GaN power transistors. These methodologies are oriented around hard-switching environments where both high voltage biases and high conduction current exist and stress the intrinsic semiconductor properties. Experimental evaluations were conducted of both material technologies where the electrical properties were monitored over time to identify any degradation effects. Additional analyses were conducted to determine the physics-oriented failure mechanisms. This work provides insight into the limitations of these semiconductor devices for both device designers and manufacturers as well as power electronic system designers.

Les transistors ayant un faible niveau de bruit à basse fréquence, une faible puissance de dissipation et fonctionnant à basse température (≤ 4.2 K) sont actuellement inexistants alors qu’ils sont très demandés pour la réalisation de préamplificateurs à installer au plus près des détecteurs ou des dispositifs à la température de quelques dizaines de mK, dans le domaine de l’astrophysique, de la physique mésoscopique et de l’électronique spatiale. Une recherche menée depuis de nombreuses années au LPN vise à réaliser une nouvelle génération de HEMTs (High Electron Mobility Transistors) cryogéniques à haute performance pour répondre à ces demandes. Cette thèse, dans le cadre d’une collaboration entre le CNRS/LPN et le CEA/IRFU, a pour but la réalisation de préamplificateurs cryogéniques pour des microcalorimètres à 50 mK.Les travaux de cette thèse consistent en des caractérisations systématiques des paramètres électriques et des bruits des HEMTs (fabriqués au LPN) à basse température. En se basant sur les résultats expérimentaux, l’une des sources de bruit à basse fréquence dans les HEMTs a pu être identifiée, c’est-à-dire la part du courant tunnel séquentiel dans le courant de fuite de grille. Grâce à ce résultat, les hétérostructures ont été optimisées pour minimiser le courant de fuite de grille ainsi que le niveau de bruit à basse fréquence. Au cours de cette thèse, différentes méthodes spécifiques ont été développées pour mesurer de très faibles valeurs de courant de fuite de grille, les capacités du transistor et le bruit 1/f du transistor avec une très haute impédance d’entrée. Deux relations expérimentales ont été observées, l’une sur le bruit 1/f et l’autre sur le bruit blanc dans ces HEMTs à 4.2 K. Des avancées notables ont été réalisées, à titre d’indication, les HEMTs avec une capacité de grille de 92 pF et une consommation de 100 µW peuvent atteindre un niveau de bruit en tension de 6.3 nV/√Hz à 1 Hz, un niveau de bruit blanc de 0.2 nV/√Hz et un niveau de bruit en courant de 50 aA/√Hz à 10 Hz. Enfin, une série de 400 HEMTs, qui répondent pleinement aux spécifications demandées pour la réalisation de préamplificateurs au CEA/IRFU, a été réalisée. Les résultats de cette thèse constitueront une base solide pour une meilleure compréhension du bruit 1/f et du bruit blanc dans les HEMTs cryogéniques afin de les améliorer pour les diverses applications envisagées. / Transistors with low noise level at low frequency, low-power dissipation and operating at low temperature (≤ 4.2 K) are currently non-existent, however, they are widely required for realizing cryogenic preamplifiers which can be installed close to sensors or devices at a temperature of few tens of mK, in astrophysics, mesoscopic physics and space electronics. Research conducted over many years at LPN aims to a new generation of high-performance cryogenic HEMTs (High Electron Mobility Transistors) to meet these needs. This thesis, through the collaboration between the CNRS/LPN and the CEA/IRFU, aims for the realization of cryogenic preamplifiers for microcalorimeters at 50 mK.The work of this thesis consists of systematic characterizations of electrical and noise parameters of the HEMTs (fabricated at LPN) at low temperatures. Based on the experimental results, one of the low-frequency-noise sources in the HEMTs has been identified, i.e., the sequential tunneling part in the gate leakage current. Thanks to this result, heterostructures have been optimized to minimize the gate leakage current and the low frequency noise. During this thesis, specific methods have been developed to measure very low-gate-leakage-current values, transistor’s capacitances and the 1/f noise with a very high input impedance. Two experimental relationships have been observed, one for the 1/f noise and other for the white noise in these HEMTs at 4.2 K. Significant advances have been made, for information, the HEMTs with a gate capacitance of 92 pF and a consumption of 100 µW can reach a noise voltage of 6.3 nV/√ Hz at 1 Hz, a white noise voltage of 0.2 nV/√ Hz, and a noise current of 50 aA/√Hz at 10 Hz. Finally, a series of 400 HEMTs has been realized which fully meet the specifications required for realizing preamplifiers at CEA/IRFU. The results of this thesis will provide a solid base for a better understanding of 1/f noise and white noise in cryogenic HEMTs with the objective to improve them for various considered applications.