Surface stabilized ferroelectric liquid crystal device (SSFLCD) has fast response time and exhibits excellent bistability. The SSFLCD has wide view angle because it operates in the in plane switching (IPS) mode. However, SSFLCD is a thin device, the uniform of its cell gap is difficult to control. When surface stabilized ferroelectric liquid crystal align, it is easy to bring in zigzag defect. In this study, the use of SU-8 photoresist to make photospacer by using photolithographic technique is studied. We control the thickness of photospacer at 1.08£gm. By using photospacer, we can get the cell with uniform cell gap. The influence of the property of the alignment layer and photospacer on surface stabilized ferroelectric liquid crystal alignment are discussed. We find that when the liquid crystal is injected anti-parallel to the rubbing direction, the alignment of Surface stabilized ferroelectric liquid crystal is easily influenced by photospacers. Wetting characteristics of the substrates is found to strongly affect the alignment of the ferroelectric liquid crystal.