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LASER SHOCK IMPRINTING OF METALLIC MEMBRANES TOWARD SOFT TEMPLATES AND ITS APPLICATIONSShengyu Jin (5929850) 25 June 2020 (has links)
<p>Laser
shock imprinting (LSI) is a novel fabrication technique capable of
manufacturing various membrane materials. This top-down imprinting process can
fabricate membranes in high precision, high throughput, and large scalability. It
reveals a variety of applications ranging from electronics to photonics, which is
beneficial from its reliable and precise modulation of micro/nanostructures. </p>
<p> In
this thesis, we firstly proposed and developed a cost-effective LSI process to
manufacture hierarchical micro/nanostructured power generators. By combining
the conventional soft lithography technique, LSI is well compatible with it to
fabricate metal membranes towards soft templates. It is a significant progress
from the originally-developed silicon wafer template layout because it effectively reduces the process cost by
replacing sophisticatedly developed silicon wafers with low-cost photocurable
polymers. In addition, the use of polymer expands the boundary limit of geometrical
complexity from simple patterns to hierarchical structures, as a result, we
successfully conducted LSI technology to fabricate biomimic leaf structures
into metallic membranes with the help of soft SU-8 templates. These fabricated
metallic membraned are used as water-driven triboelectric nanogenerators. In addition to the introduction of polymer template, we
further developed a successive laser shock imprinting (SLSI) process to fabricate
hierarchical nanostructures in a higher resolution. Typically, grating
templates are collected via recycling blank discs and used as soft templates.
Then multiple times of LSI process are conducted to manufacture membranes into
complex nanostructures. The use of blank disc further reduces cost and increase
process resolution. The highlight of this part of work is to feature the
introduction of metallic thin films on disc template, which plays a significant
role during this high strain rate imprinting process. Then, the imprinting
mechanism was investigated through the finite element method to validate the
experimental findings. Lastly, this soft template LSI process was applied to
fabricate low dimensional materials such as nanowires (1D) and nanomembranes
(2D), potentially introducing homogeneous and inhomogeneous strain field. Kelvin
probe force microscopy was used to directly probe strain-induced changes. This
soft-template LSI process reveals a new route of precisely fabricating low
dimensional membranes into nanoelectronics systems. </p>
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