The development of application software for e-beam writter data preparation. Master thesis. Brno, 2016. The master thesis deals with the e-beam writter data preparation. The first part deals with electron beam lithography, posibilities and problems of data preparation and difractive optical elements. Afterwards the thesis describes development environment which was used for the development of application software itself. In the next part, the thesis deals with the appropriate design of application software, and its user-friendly interface. The output of the thesis is the implementation of the application software.

Tato diplomová práce se zabývá dotováním grafenu nízkoenergiovými elektrony. Na křemíkový substrát pokrytý vrstvou SiO2 jsou pomocí litograficky vyrobené masky nadeponované kovové kontakty z titanu a zlata. Grafen vyrobený pomocí metody depozice z plynné fáze je přenesen na substrát a slouží jako vodivé spojení kovových elektrod, které vytvářejí kolektor a emitor. Na křemík je ze spodu přivedeno napětí, které tak vytváří spodní hradlo. Takto vytvořený grafenový tranzistor je ozařován nízkoenergiovými elektrony, které mění dotování grafenu. Z polohy maxima v závislosti odporu grafenu na hradlovém napětí lze vyčíst typ dotování. Toto maximum udává napětí, při kterém Fermiho meze grafenu prochází Diracovým bodem v pásové struktuře grafenu. Velikost hradlového napětí, primární energie elektronového svazku a proud svazku jsou tři parametry, které mají velký vliv na změny dotování. Při ozařování transistoru dochází ke změně typu dotování právě tehdy, když odpor grafenu v závislosti na hradlovém napětí dosáhne maxima. Vývoj této změny je zkoumán pro různé energie a proudy primárního svazku v závislosti na hradlovém napětí i v čase. Typ dotování je také prozkoumán při zastavení ozařování v různých fázích smyčky hradlového napětí. Dopování grafenu nízkoenergiovými elektrony je popsáno v teoretickém modelu.

The aim of this work is fabrication of nanostructures and measurement of their electrotransport properties. There are two different methods used for fabrication - electron beam lithography with sputtering of thin films and focused ion beam with deposition from gas phase. I-V characteristic was measured for characterisation of as prepared nanostructures - wires. Material of wires prepared by using of electron beam lithography was permalloy - an alloy of iron and nickel. Second types of wires prepared by using of chemical vapor deposition induced by focused ion beam was platinum based.

The diploma thesis deals with the switching of spin vortices in magnetic nanodisks. First, the basic concepts of (micro)magnetism are defined and existing theoretical and experimental achievements in the field of switching of the two basic characteristics (chirality and polarity) of magnetic vortex are summarized. Then the principle of dynamic switching of magnetic vortex chirality using in-plane magnetic field pulse with a well defined amplitude and duration is presented. There is no need to use a certain shape of nanodisks or asymmetry in magnetic field distribution. Nanostructures were prepared by the multi-step electron beam lithography and ion beam sputtering. Individual steps of sample preparation and optimization for the magnetization dynamics measurements are described. Finally, the experimental measurements of the dynamic switching of chirality on prepared samples obtained by transmission x-ray microscopy at the synchrotron Advanced Light Source at Berkeley, USA are presented and discussed.

This diploma thesis deals with study of resonance modes of plasmonic structures. First part provides an overview of theoretical models, which explain the resonanace modes in plasmonic structures. Next part describes technology of electron beam lithography. First section of experimental part deas with technological processes leading to an improvement of resulting structures made by electron beam lithography that is followed by lift-off process. Last part focuses on a study of reflectance spactra of plasmonic antenas and the identification of resonance modes.

This thesis describes several techniques for the optimization of the manufacturing of relief diffractive structures used as optical elements by Electron beam lithograph BS600 in the Electron beam laboratory of the Institute of Scientific Instruments of the Academy of Sciences of the Czech Republic. The Electron beam lithograph BS600 was originally developed and constructed in the Institute of Scientific Instruments of the Academy of Sciences of the Czech Republic for Tesla in 1983, but is still developing, which was published. The Electron been lithograph BS600 is specific in these days because of its accelerating potential and is unique in the world because of the possibility to shape the beam. The optimization of manufacturing of relief diffractive structures, used as optical elements, was mostly reached by analysis, bringing optimal solution for the required effect. Moreover, an algorithm was developed for driving the electron beam position, shape, size and the time of each elementary exposition. The analysis showed that is convenient to use mathematical description of separate lines of diffractive structures. A separate subject was carried out for the calibration of the exposition field of the Electron beam lithograph BS600.

The diploma thesis deals with cellular membrane model preparation on microfluidic devices. It summarizes means of microfluidic device fabrication, phospholipid bilayer formation mechanisms, optimization techniques and characterization methods of those systems. It focuses on free-standing planar lipid bilayers which are easily accessible by a number of different characterization methods and at the same time exhibit good stability and variability. The aim of this work is to design and prepare a microfluidic chip on which a planar lipid bilayer can be prepared. It therefore presents microfluidic device prepared by soft lithography of PDMS adapted for model membrane formation by self-assembly of phospholipids at the interface of aqueous and organic phases created by the architecture of the microfluidic device. Formation of the model membrane was visualized by optical microscopy and fluorescence-lifetime imaging microscopy.

This thesis deals with grayscale e-beam lithography and diffractive optical elements fabrication. Three topics are addressed. The first topic is combined grayscale e-beam lithography. The goal of this task is combining exposures performed by two systems with various beam energies. This combined technique leads to a better usage of both systems because various structures can be more easily prepared by one electron beam energy than by the other. The next topic is the optimization of shape borders of exposing structures that are defined by image input. The influence of such optimization on exposure data preparation is evaluated, as well as the exposure time and the change of optical properties of testing structures. The possibility of deep multilevel diffractive optical element fabrication in plexiglass blocks is researched as the third topic. Plexiglass can replace the system of a resist and a substrate. A new approach to writing down the structures by electron beam is presented, minimizing thermal stress on the plexiglass block during the exposure. The writing method also improves the homogeneity of exposed motifs. A method for computing the exposure dose for specific multilevel structures was designed. This method is based on the existing model of proximity effect computation and it minimizes the computing time necessary to obtain the exposure doses.

This master thesis deals with the use of microfluidics for the purpose of microfluidic enzymatic reactor for drug screening. At first it considers the issue from a theoretical point of view – describes microfluidics as a newly developing and promising field of production of microfluidic devices, materials, biomedical applications and advantages and disadvantages of microfluidics overall. Furthermore, it focuses on an area of analytical utilization of enzymes within enzyme reactors. In the first part of the experimental section, conditions for the testing of enzymes of xenobiotics metabolism in the liver were optimized, namely the model of coumarin metabolism via the spectrofluorimetry method. The second part of the experimental work dealt with optimization of the fabrication conditions of microfluidic chips from OSTE (off-stoichiometry Thiol Ene) via the soft lithography method. Subsequently, the functionality of the produced chips was tested. Based on the results of both parts of the experimental work, an evaluation was carried out to assess the suitability of their interconnection for future research – screening of microsomal enzyme activity and model biotransformation of drugs within the channels of the fabricated devices.

Tato dizertční práce se zabývá výrbou a charakterizací plasmonických nanostruktur. Její první část začíná krátkým úvodem do plasmoniky s navazujícím přehledem metod, které jsou v dnešní době nejčastěji používány k výrobě a charakterizaci plasmonických nanostruktur. Druhá část se pak zaměřuje na samotný výzkum, který byl v rámci PhD studia realizován. Cílem prvních experimentů bylo prozkouat možnosti použití elektronové litografie za variabilního tlaku v procesní komoře pro výrobu plasmonických nanostruktur na nevodivých substrátech jako je např. sklo. Jelikož se jedná o materiály, které jsou velice často používány k přípravě plasmonických struktur pacujících v oblasti viditelného světla. Druhá sekce pak diskutuje některé specifické aspekty přípravy plasmonických mikrostruktur elektronovou litografií pro THz oblast. Poslední část se pak zaměřuje na funkční vlastnosti plasmonických nanostruktur, převážně pak na kvantitativní charakterizaci fáze dalekého pole indukovaného plasmonickými nanostrukturami a jejich aplikacemi v oblasti optických metapovrchů - uměle připravených povrchů, které mohou být použity jako planární optické komponenty. Práce demonstruje a diskutuje různé experimentální přístupy použití mimoosové holografické mikroskopie pro jejich charakterizaci.