A variety of benefits motivate the development of epitaxial metals, among which include the ability to design fully integrated layer structures where metallic films and nanostructures can be embedded into the cores of optoelectronic devices. Applications include high-performance tunnel-junctions, epitaxial transparent Ohmic contacts, photomixer material, and thermoelectrics. Additionally, the integration of metallic nanostructures and films into optoelectronic devices has shown potential for improving device performance and functionality through sub-wavelength confinement of plasmonic modes and enhancement of light/matter interactions. The rare-earth monopnictide (RE-V) material system can be integrated epitaxially with conventional zincblende III-V substrates under normal growth conditions, resulting in high-quality, thermodynamically stable interfaces. The RE-V semimetals span a range of optical, electrical, and structural properties, making them ideal for integration into III-V-based optoelectronic devices and applications. In this dissertation, high-quality epitaxial LuAs, LaAs and La(x)Lu(1-x)As films and nanostructures were grown and characterized for their structural, electrical, optical, and plasmonic properties. Through a sweep of alloy film compositions of the RE-V alloy material La(x)Lu(1-x)As, the ability to produce tunable epitaxial metals was demonstrated, with a range of peak transmission spectra from near- to mid-infrared wavelengths, plasmonic response in the mid-infrared, moderate resistivity, and lattice-matching potential to many relevant III-V substrates. Additionally, there is a great deal of interest in developing techniques to produce optoelectronic devices that are not restricted by substrate lattice constant. Many epitaxial approaches have been tried, with moderate success; however, growing low defect-density heteroepitaxial materials with differing crystal structures and highly-mismatched lattice parameters is extremely challenging, and such structures suffer from poor thermal properties and reliability issues. A general approach is needed for thin metamorphic buffer layers with minimal threading dislocations that simultaneously have low thermal resistance for effective heat-sinking and device reliability. An investigation was conducted into the use of RE-V nanostructure superlattices towards the reduction of dislocation density in highly-mismatched III-V systems. / text

<p>Metamorphic buffer (MB) layers were studied as a means to grow epilayers on top of a GaAs substrate which have different lattice constant than the GaAs. Growths were done by molecular beam epitaxy on a GaAs (001) substrate. The growths of step-graded InGaAs and InGaAsP MBs have been investigated using both linear and logarithmic grading profiles. The logarithmic grading profile shows slight improvement in the crystal quality over the linear grading profiles. This is an indication that instead of increasing the strain with the same grading rate, it may be helpful to have higher grading rate at the beginning and lower grading rate at the end of the buffer. InGaAsP graded buffers were grown where group III ratio was kept fixed. However due to the existence of phase separation and lower relaxation the quaternary growths exhibited no performance improvement as might have been expected from growths with only group V grading. Also, the effects of using an InGaP layer grown at low temperature before the MB were determined. Quantum wells (QW), which were grown on top of the MBs, were used to probe the optical emission properties. No significant difference was observed in photoluminescence between the samples with a low temperature layer and without a low temperature layer. Annealing enhanced the PL intensity but the crystal quality degraded due to the appearance of surface defects. Surface undulations, known as “cross-hatch” (CH), were observed in the top MB layers. Atomic force microscopy (AFM) was used to analyze the surface morphology and degree of polarization (DOP) measurement was used to analyze the strain features in the final MB layer. Similar patterns of both surface morphology and strain field indicate a correlation between these two. From analysis of the periodicity of strain field and the CH, evidence was found in the support of one of the existing models of CH evolution which implies that the CH appears before the formation of MDs and subsequently MDs form at some troughs in the undulation.</p> / Master of Applied Science (MASc)