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Development of Colloid Displacement Lithography Platforms for Sensor ApplicationsThugu, Mahesh 01 August 2013 (has links)
In this work, Poly (diallyldimethylammonium) chloride - (PDDA) was used as a base layer for developing colloid displacement lithography platforms for sensor applications. Previous work shows that glass coated with PDDA and exposed to gold acts as a good platform for colloid displacement lithography. However, for actual sensor applications, electrical isolation of individual sensor sections must be achieved. This is attempted by laying down a 40 μm stripe of PDDA on a cleaned substrate and coating that stripe with gold colloid. The size of 40 μm or less in width is set as the target to fit within the scan window of the AFM. Stripes wider than about 40 μm would be difficult to efficiently pattern with colloid displacement lithography. While the goal of 40 μm wide stripes was achieved with sufficiently diluted PDDA solution, it was found to be difficult to adsorb sufficient amounts of gold colloid on those stripes before the stripes were lost from the glass substrate. Further, electroless deposition was found to produce only a small amount of gold on the PDDA surface without colloid nucleation sites being present.
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