The work is aimed at preparation and characterization of thin films deposited by Plasma-Enhanced Chemical Vapor Deposition (PE-CVD) on silicon wafers. A comprehensive characterization of the deposition system in order to determine the range of deposition conditions was a part of the study. Subsequently, the single and multi-layers were deposited from tetravinylsilane monomer. The deposition process was monitored by spectroscopic ellipsometry and mass spectroscopy. Layers and layered structures were characterized by microscopic and spectroscopic techniques. The physical and chemical properties of deposited films were studied with respect to the deposition conditions and monomer fragmentation in low-temperature plasma.

The diploma thesis is aimed at coating of glass fibers using tetravinylsilane as a monomer by Plasma-Enhanced Chemical Vapor Deposition (PECVD). The surface modified fibers were used as reinforcements for unsaturated polyester resin to form composites of controlled interphase. Chemical and mechanical properties of thin films were controled by the effective power. Determination of fiber-matrix adhesion and an influence of polymer-interface on mechanical properties of composites were characterized by Scanning Electron Microscopy (SEM) and microindentation technique using Interfacial Testing System (ITS) enabling to measure the interfacial shear strength.

Tato studie je zaměřena na základní výzkum tenkých vrstev plazmových polymerů a vliv depozičních podmínek na strukturu a vlastnosti jednotlivých vrstev a multivrstev připravených pomocí metody PE CVD. Jednotlivé vrstvy a multivrstvy a-SiC:H byly deponovány na křemíkové substráty z monomeru tetravinylsilanu (TVS) při různých výkonech v kontinuálním a pulzním režimu. Vrstvy byly rozsáhle zkoumány pomocí spektroskopické elipsometrie, nanoindentace, mikroskopie atomárních sil (AFM), rentgenové fotoelektronové spektroskopie (XPS), spektroskopie Rutherfordova zpětného rozptylu (RBS), rentgenové reflektivity, Fourierovy transformační infračervené spektroskopie (FTIR) a měření kontaktního úhlu, pro zjištění jejich optických, mechanických a chemických vlastností. Byl zkoumán a prokázán vliv depozičních podmínek na fyzikálně-chemické vlastnosti pp-TVS vrstev. Jednotlivé vrstvy byly v rámci po-depoziční úpravy vystaveny UV záření a byl zkoumán účinek stárnutí a vliv UV záření na jejich fyzikální a chemické vlastnosti. Multivrstevnaté struktury (plazmaticky polymerizované 2-vrstvy a 10-ti-vrstvy) s tloušťkou jednotlivých vrstev od 0,5 µm do 25 nm byly úspěšně deponovány a charakterizovány pomocí elipsometrické spektroskopie. Na základě získaných poznatků je možné připravit materiály s vlastnostmi upravenými podle požadavků pro využití v nanokompozitních aplikacích a optických zařízeních.

Thesis in theoretical part is focused on the principle of spectroscopic ellipsometry and formation of thin films by plasma-enhanced chemical vapor deposition (PECVD). In the experimental part we describe the deposition system, ellipsometer and mathematical evaluation of ellipsometric data, materials used for film formation and processing of the samples. Single-layer and multilayer structures of polymeric materials were prepared. We revealed that the optical properties of thin films are independent of film thickness. We also described the effect of the effective power and deposition gas mixture on optical properties of thin films.

Cieľom diplomovej práce je príprava polymerných kompozitov vyztužených sklenenými vláknami s riadenou medzifázou za použitia metódy plazmochemickej depozície z plynnej fáze a monomeru tetravinylsilanu. Teoretická časť je zameraná na literárnu rešerš o plazme, plazmovej polymerácií, tenkých vrstvách a kompozitoch. Experimentálna časť popisuje použité materiály a aparaturu použitú na povrchovú modifikáciu sklenených vlákien a prípravu vláknom vyztužených kompozitov. Povrchová úprava sklenených vlákien prebiehala za rôznych depozičných podmienok. Chemické a mechanické analýzy vytvorenej medzivrstvy prebiehali za použitia FTIR spektrometrie a vrypového testu. Vliv povrchovej úpravy bol zistený pomocou získanej interlaminárnej šmykovej sily použítím testu krátkych trámečkov.

Diploma thesis deals with preparation of multilayered organic-inorganic nanostructures via PECVD technology and analysis of optical properties of these layers by spectroscopic ellipsometry. The theoretical part handles the definition of thin layers, layered and gradient nanostructures, plasma enhanced chemical vapor deposition and principles of spectroscopic ellipsometry. In the experimental part, used materials and chemicals are described, afterwards follow a complete description of the apparatus used for sample preparation and a description of the sample preparation procedure. The results part consists of methodology of preparing material models necessary for ellipsometric measurements and evaluation of optical properties of deposited nanolayers.

Plasma-enhanced chemical vapor deposition is a promising technology for the preparation of materials in the form of thin films with controlled physical-chemical properties, which can be affected by changing input precursors or deposition conditions as needed. In this thesis, plasma nanotechnology was used to synthesize thin films on silicon wafers. Tetravinylsilane was chosen as a precursor for the synthesis of the films. In addition to pure tetravinylsilane, mixtures of tetravinylsilane with argon and mixtures of tetravinylsilane with oxygen were also used as input precursors for film deposition, in different proportions of the individual component in the deposition mixture. Using chemical analyses, specifically infrared spectroscopy, photoelectron spectroscopy and selected ion techniques, the chemical structure of the prepared films was examined in detail and the dependence of this structure on deposition conditions and input precursors was studied. This thesis confirms, that by changing effective power supplied to the plasma discharge and selecting different input precursors, it is possible to control chemical structure, and thus the properties of the prepared nanolayers.

This thesis is aimed at preparation of thin plasma-polymerized films deposited on glass fibers by Plasma-Enhanced Chemical Vapor Deposition (PE CVD) from a mixture of tetravinylsilane (TVS) and oxygen gas. Plasma-polymerized films which were deposited on silicon wafers were used to characterize chemical properties and optimization of deposition process with respect to reproducibility.

Plasma polymer films of tetravinylsilane and mixture of tetravinylsilane and oxygen gas were deposited on silicon wafers. Oxygen gas was mixed in tetravinylsilane to improve the compatibility of thin films on glass substrates. Mass spectroscopy was employed during the cleaning of the deposition chamber to check residual gases and process gases, during plasma deposition to monitor neutral plasma species and to follow plasma stability.

Theoretical part of this master thesis was focused on literature recherché dealing with the formation of thin films, plasma, plasma analyses using mass spectrometry and plasma polymerization. Further, this section describes the analysis of thin films using optical methods such as spectroscopic ellipsometry and FT-IR spectrometry. Experimental part describes the materials which are used for the preparation of thin films as well as a description of the equipment for preparation of thin films using a technology of plasma-enhanced chemical vapor deposition (PE-CVD). Control of deposition conditions and monitoring of plasma with its products result in high reproducibility of thin films. The last part of the thesis describes the results of measurement of the first group of samples and their ellipsometric, mass spectrometry and FT-IR evaluation with respect to the deposition conditions.