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Experimental and numerical investigation of the thermomechanical response of reticles during the optical lithography process /

Thesis (Ph. D.)--University of Wisconsin--Madison, 2003. / Includes bibliographical references. Also available on the Internet.

Identiferoai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/53956697
Date January 2003
CreatorsAbdo, Amr Yehia.
Source SetsOCLC
LanguageEnglish
Detected LanguageEnglish

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