Design and study of advanced photoresist materials : positive tone photoresists with reduced environmental impact and materials for 157 nm lithography /

Description

Thesis (Ph. D.)--University of Texas at Austin, 2000. / Vita. Includes bibliographical references (leaves 266-276). Available also in a digital version from Dissertation Abstracts.

Links & Downloads

1. http://wwwlib.umi.com/cr/utexas/fullcit?p3004404

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Additional Fields

Identifer	oai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/51515340
Date	January 2000
Creators	Yamada, Shintaro,
Source Sets	OCLC
Language	English
Detected Language	English
Source	Full text (PDF) from UMI/Dissertation Abstracts International