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Optimalizace depozičních parametrů za účelem vytvoření fotokatalytických titanoxidových vrstev metodou PECVD / Optimization of deposition parameters in order to create a photocatalytic titanium oxide films produced by PECVD

This thesis presents Photocatalytic TiOx layers created by own PECVD reactor assembled in the building of Department of Applied Physics and Technics. Parameters of depositions were optimalized as well as the PECVD reactor itself. Final layers are compared to layers made by Degussa P25. As a result based on the included measurements, this thesis tries to answer the question whether PECVD is the suitable method for depositions of photocatalytic layers.

Identiferoai:union.ndltd.org:nusl.cz/oai:invenio.nusl.cz:153375
Date January 2013
CreatorsPEKÁREK, Michal
Source SetsCzech ETDs
LanguageCzech
Detected LanguageEnglish
Typeinfo:eu-repo/semantics/masterThesis
Rightsinfo:eu-repo/semantics/restrictedAccess

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