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Comparison of ellipso-polarimetry and dark-field methods for determination of thickness variations in thin films /

Thesis (M.S.)--Rochester Institute of Technology, 1991. / Typescript. Includes bibliographical references (67-69).

Identiferoai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/27417040
Date January 1992
CreatorsEubanks, Craig S.
Source SetsOCLC
LanguageEnglish
Detected LanguageEnglish
SourceOnline version of thesis

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