A Ti:sapphire waveguide laser is attractive as it would provide a compact, stable, broadly tunable (660-1180 nm) and versatile radiation source ideal for remote sensing or spectroscopy. This thesis reports the applicability of ion implantation to the fabrication of the Ti:sapphire waveguide laser in c-axis oriented Al2O3. These results comprise the first realisation of the Ti:Al2O3 material by ion implantation. The substrate quality was optimised for the synthesis conditions and co-implantation was explored though a comparative study of Cr/O. The formation of waveguides via direct and indirect approaches was then pursued with limited success.
| Identifer | oai:union.ndltd.org:ADTP/245076 |
| Creators | Morpeth, Leigh David |
| Source Sets | Australiasian Digital Theses Program |
| Language | English |
| Detected Language | English |
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