Due to the fast expansion and development in the optical communication industry, the demand for the film quality has correspondingly increased. Ion beam sputter deposition (IBSD) achieves the lowest loss, but low throughput. In our Lab., E-beam system was used for CaO, MgO and Cr2O3 evaporation on the circumference of the Cr:YAG crystal fiber. Although the substrate was heated to around 275oC, the thin film didn¡¦t achieve low loss and high laser-induced damage threshold film. Adding ion-beam assisted deposition (IAD) system to enhance the thin film energy and packing density is the main theme of this thesis.
The thesis mainly focuses on the characteristics of TiO2 and SiO2 thin film based on E-beam with IAD system. Spectrometer analyzer and Macleod software were used to calculate the refractive index and extinction coefficient. ESCA (electron spectroscopy for chemical analyzer) was adopt to measure the thin film composition of Ti, Si, O. SEM (scanning electron microscope) was used to observe the thin film quality. Low loss and high laser-induced damage threshold thin film are the goal of the present research. With optimized parameters, the refractive index of TiO2 film was achieved to be 2.51 at 500 nm, and the extinction coefficient was less than 2x10-4. The refractive index of SiO2 film can be achieved to be 1.466 at 500 nm, and the extinction coefficient was less than 1x10-4. An HR (R>99.83%) coating at 1233 nm was successfully demonstrated by the IAD deposition system.
Identifer | oai:union.ndltd.org:NSYSU/oai:NSYSU:etd-0713106-195900 |
Date | 13 July 2006 |
Creators | Lu, Meng-Jen |
Contributors | Sheng-Lung Huang, Wood-Hi Cheng, Fu-Jen Kao, Gong-Ru Lin, Jui-Hung Hsu |
Publisher | NSYSU |
Source Sets | NSYSU Electronic Thesis and Dissertation Archive |
Language | Cholon |
Detected Language | English |
Type | text |
Format | application/pdf |
Source | http://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0713106-195900 |
Rights | restricted, Copyright information available at source archive |
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