¡@¡@The purpose of thesis is to study the responses of nanoindentation in fused silica. By experiments the mechanical properties of intrinsic fused silica were obtained. From the finite element simulation the response of material was estimated. Our main work is on simulation. This part includes the effects of different coefficient of friction, different indentation depth, tip rounding, and substrates of thin films.
¡@¡@First, the experimental load¡Vdisplacement curves were obtained through the nanoindentation sensing system. Then, a three-dimensional finite element was successfully modeled through the comparison of the load¡Vdisplacement curves of the experiment and the simulation. The yield stress and the strain-hardness trend of intrinsic fused silica were obtained.
¡@¡@For different coefficient of friction and different tip radii, no significant differences were found through the load¡Vdisplacement curves and von Mises stress distributions. For different indentation depths, varied trends were found through the load¡Vdisplacement curves and von Mises stress distributions. For substrate effect, no significant differences could be found through the normalized hardness. The intrinsic film hardness could be obtained for indentation depth less 20% of the total indentation depth.
| Identifer | oai:union.ndltd.org:NSYSU/oai:NSYSU:etd-0709108-203130 |
| Date | 09 July 2008 |
| Creators | Hung, Che-yuan |
| Contributors | Ming-Hwa R. Jen, Jacob Chih-Ching Huang, Liu. C. F., Yi-Shao Lai, H.K. Kung |
| Publisher | NSYSU |
| Source Sets | NSYSU Electronic Thesis and Dissertation Archive |
| Language | Cholon |
| Detected Language | English |
| Type | text |
| Format | application/pdf |
| Source | http://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0709108-203130 |
| Rights | not_available, Copyright information available at source archive |
Page generated in 0.002 seconds