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Hall effect of LPCVD doped silicon films =.

by Ong Chung Wo. / Bibliography: leaves 118-120 / Thesis (M.Ph.)--Chinese University of Hong Kong, 1986

Identiferoai:union.ndltd.org:cuhk.edu.hk/oai:cuhk-dr:cuhk_319991
Date January 1986
ContributorsOng, Chung Wo., Chinese University of Hong Kong Graduate School. Division of Physics.
PublisherChinese University of Hong Kong
Source SetsThe Chinese University of Hong Kong
LanguageEnglish
Detected LanguageEnglish
TypeText
Formatprint, 120 leaves : ill. ; 30 cm
RightsUse of this resource is governed by the terms and conditions of the Creative Commons “Attribution-NonCommercial-NoDerivatives 4.0 International” License (http://creativecommons.org/licenses/by-nc-nd/4.0/)

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