by Yeung Ching Chung. / Thesis (M.Phil.)--Chinese University of Hong Kong, 1998. / Includes bibliographical references (leaves 69-71). / Text in English; abstract also in Chinese. / by Yeung Ching Chung. / Table of contents --- p.i / Chapter Chapter 1 --- Introduction / Chapter 1.1 --- General overview --- p.1 / Chapter 1.2 --- The present study --- p.3 / Chapter Chapter 2 --- Sample preparation and characterization / Chapter 2.1 --- Sample preparation / Chapter A. --- General description --- p.5 / Chapter B. --- The thermal pulse furnace --- p.7 / Chapter C. --- The substrates --- p.9 / Chapter D. --- Sample preparation --- p.10 / Chapter 2.2 --- Sample characterization / Chapter A. --- Micro Raman system --- p.11 / Chapter B. --- Rutherford backscattering spectrometry (RBS) --- p.12 / Chapter C. --- X-ray powder diffraction --- p.13 / Chapter D. --- AFM. SEM and Surface Profiler --- p.13 / Chapter Chapter 3 --- Results and discussion / Chapter 3.1 --- The surface morphology / Chapter A. --- General description --- p.15 / Chapter B. --- The as-deposited amorphous film --- p.15 / Chapter C. --- The crystalline Ge film --- p.16 / Chapter D. --- The alloy film --- p.17 / Chapter E. --- The role of a-Si layer --- p.22 / Chapter 3.2 --- The depth profile (RBS) / Chapter A. --- General description --- p.24 / Chapter B. --- Peak temperature dependence --- p.27 / Chapter C. --- Heating rate dependence --- p.30 / Chapter 3.3 --- The near surface composition measured by Raman scattering / Chapter A. --- General description --- p.33 / Chapter B. --- Peak temperature dependence --- p.43 / Chapter C. --- Heating rate dependence --- p.45 / Chapter 3.4 --- Preferred growth direction / Chapter A. --- General description --- p.47 / Chapter B. --- Peak temperature dependence --- p.48 / Chapter C. --- Heating rate dependence --- p.51 / Chapter 3.5 --- Discussion / Chapter A. --- The particle size --- p.55 / Chapter B. --- The participation of Si substrate --- p.58 / Chapter C. --- The alloy formation --- p.58 / Chapter D. --- The abnormally fast interdiffusion --- p.63 / Chapter Chapter 4 --- Conclusion --- p.65 / Appendix --- p.67 / References --- p.69
| Identifer | oai:union.ndltd.org:cuhk.edu.hk/oai:cuhk-dr:cuhk_322296 |
| Date | January 1998 |
| Contributors | Yeung, Ching Chung., Chinese University of Hong Kong Graduate School. Division of Physics. |
| Source Sets | The Chinese University of Hong Kong |
| Language | English, Chinese |
| Detected Language | English |
| Type | Text, bibliography |
| Format | print, iii, 71 leaves : ill. ; 30 cm. |
| Rights | Use of this resource is governed by the terms and conditions of the Creative Commons “Attribution-NonCommercial-NoDerivatives 4.0 International” License (http://creativecommons.org/licenses/by-nc-nd/4.0/) |
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