This work presents investigations into the possibility of using the method of DC magnetron sputtering for the deposition of CuInSei (CIS) thin films. Two different approaches have been used for the suitability of manufacturing stoichiometric CIS layers. For both cases the target material consisted of non-stoichiometric CIS powder.
| Identifer | oai:union.ndltd.org:bl.uk/oai:ethos.bl.uk:491038 |
| Date | January 2006 |
| Creators | Hisek, Joerg |
| Publisher | University of Salford |
| Source Sets | Ethos UK |
| Detected Language | English |
| Type | Electronic Thesis or Dissertation |
Page generated in 0.0023 seconds