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Degradation of gate dielectric under hot hole stress

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Identiferoai:union.ndltd.org:bl.uk/oai:ethos.bl.uk:394231
Date January 2000
CreatorsSii, How King
PublisherLiverpool John Moores University
Source SetsEthos UK
Detected LanguageEnglish
TypeElectronic Thesis or Dissertation

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