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An investigation on the ultra-low energy As ion implantation process and the dopant behaviour during thermal processing

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  1. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.395660
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537.622
Additional Fields
Identiferoai:union.ndltd.org:bl.uk/oai:ethos.bl.uk:395660
Date January 2001
CreatorsWhelan, Sean
PublisherUniversity of Salford
Source SetsEthos UK
Detected LanguageEnglish
TypeElectronic Thesis or Dissertation

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