Return to search

Reduced boron diffusion under point defect injection in fluorine implanted silicon

No description available.
Identiferoai:union.ndltd.org:bl.uk/oai:ethos.bl.uk:443049
Date January 2007
CreatorsKham, Man Niang
PublisherUniversity of Southampton
Source SetsEthos UK
Detected LanguageEnglish
TypeElectronic Thesis or Dissertation

Page generated in 0.0121 seconds