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Electrical effects of boron and argon implantation in silicon

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  1. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.462986
Tags
541.37
Additional Fields
Identiferoai:union.ndltd.org:bl.uk/oai:ethos.bl.uk:462986
Date January 1979
CreatorsLee, S. K. W.
PublisherLancaster University
Source SetsEthos UK
Detected LanguageEnglish
TypeElectronic Thesis or Dissertation

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