In this research, cobalt ferrite thin films were deposited at 523 K which eliminates the need for annealing at higher temperatures and offers hope for integration of the thin films into micro-electromechanical devices.
| Identifer | oai:union.ndltd.org:bl.uk/oai:ethos.bl.uk:584801 |
| Date | January 2010 |
| Creators | Nlebedim, Cajetan Ikenna |
| Publisher | Cardiff University |
| Source Sets | Ethos UK |
| Detected Language | English |
| Type | Electronic Thesis or Dissertation |
| Source | http://orca.cf.ac.uk/54153/ |
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