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X-Ray Absorption Spectroscopy of Pd40Ni40P20 Metallic Glass and Boron Doped Silicon

<p> Ni K extended X-ray absorption fine structure spectroscopy recorded with synchrotron radiation at 77 K and 300 K, has been used to investigate various annealed Pd40Ni40P20 metallic glass samples. The structural parameters (radial distance, coordination number, Debye Waller factor) for the Fourier filtered first coordination shell were obtained via curve analysis using MFIT (multifitting analysis) and plotted as a function of annealing temperature. Similar trends between 77 K and 300 K data were not observed in all cases. These results lead one to believe that the curve fitting procedure is not yet optimized and makes one sceptical of attributing any meaning to the results.</p> <p> X-ray absorption near edge spectroscopy via electron yield detection has also been used to study the B K edge in boron doped silicon. It was found that a strong peak at 195 eV is directly related to trigonally coordinated boron. Non trigonally coordinated boron did not seem to produce this spike. Results show that B 1s spectroscopy is a very sensitive probe of the local structure of boron.</p> / Thesis / Master of Science (MSc)

Identiferoai:union.ndltd.org:mcmaster.ca/oai:macsphere.mcmaster.ca:11375/19253
Date07 1900
CreatorsEsposto, Frank J.
ContributorsHitchcock, A. P., None
Source SetsMcMaster University
Languageen_US
Detected LanguageEnglish
TypeThesis

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