Return to search

Plasma enhanced chemical vapor deposition of thin aluminum oxide films

Thesis (M.S.)--Ohio University, March, 1993. / Title from PDF t.p.

Identiferoai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/230932303
Date January 1993
CreatorsMiller, Larry M.
PublisherOhio : Ohio University,
Source SetsOCLC
LanguageEnglish
Detected LanguageEnglish
SourceConnect to resource online

Page generated in 0.0017 seconds