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Surface investigations of the atomic layer growth mechanism in aluminum nitride thin film deposition using dimethylethylamine alane and ammonia /

Thesis (Ph. D.)--University of Washington, 1999. / Vita. Includes bibliographical references (leaves [103]-112).

Identiferoai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/42816008
Date January 1999
CreatorsKuo, Jason Se-Yung.
Source SetsOCLC
LanguageEnglish
Detected LanguageEnglish
TypeTheses
SourceConnect to this title online; UW restricted

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