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A study of cobalt silicide formed by MEVVA implantation.

by Li Chi Pui. / Thesis (M.Phil.)--Chinese University of Hong Kong, 1999. / Includes bibliographical references (leaves [105]-[109]). / Abstracts in English and Chinese. / Abstract / Acknowledgement --- p.Page no / Chapter Chapter 1. --- Introduction / Chapter 1.1 --- Metal silicides --- p.1 / Chapter 1.2 --- Cobalt silicides --- p.3 / Chapter 1.3 --- Ion beam synthesis of metal silicides by metal implantation into silicon --- p.4 / Chapter 1.4 --- Feature of MEVVA implantation --- p.5 / Chapter 1.5 --- Motivation and organisation of this thesis --- p.6 / Chapter Chapter 2. --- Sample Preparation and Characterisation Methods / Chapter 2.1 --- MEVVA implantation --- p.7 / Chapter 2.2 --- Simulation by TRIM --- p.9 / Chapter 2.3 --- Sample preparation --- p.12 / Chapter 2.4 --- Sheet resistivity measurements --- p.14 / Chapter 2.5 --- Rutherford backscattering spectroscopy (RBS) --- p.17 / Chapter 2.6 --- Transmission electron microscopy (TEM) --- p.19 / Chapter 2.6.1 --- Transmission electron microscopy (TEM) sample preparation --- p.21 / Chapter 2.7 --- Atom force microscopy (AFM) and conducting AFM --- p.31 / Chapter Chapter 3. --- Characterisation of As-implanted Samples / Chapter 3.1 --- Experimental details / Chapter 3.1.1 --- Sheet resistance measurements --- p.33 / Chapter 3.1.2 --- Rutherford backscattering spectroscopy (RES) --- p.36 / Chapter 3.1.3 --- Sputtering depth measurements --- p.43 / Chapter 3.1.4 --- Transmission electron microscopy (TEM) --- p.44 / Chapter 3.1.5 --- Spreading resistance profiling (SRP) --- p.61 / Chapter 3.1.6 --- Atom force microscopy (AFM) and conducting AFM --- p.64 / Chapter 3.2 --- Results and discussion --- p.71 / Chapter 3.3 --- Summary --- p.81 / Chapter Chapter 4. --- Characterisation of Annealed Samples / Chapter 4.1 --- Experimental details / Chapter 4.1.1 --- Rutherford backscattering spectroscopy (RBS) --- p.82 / Chapter 4.1.2 --- Transmission electron microscopy (TEM) --- p.87 / Chapter 4.1.3 --- Sheet resistance measurements --- p.98 / Chapter 4.2 --- Summary --- p.101 / Chapter Chapter 5. --- Conclusion --- p.102 / Appendix / Reference

Identiferoai:union.ndltd.org:cuhk.edu.hk/oai:cuhk-dr:cuhk_322904
Date January 1999
ContributorsLi, Chi Pui., Chinese University of Hong Kong Graduate School. Division of Electronic Engineering.
Source SetsThe Chinese University of Hong Kong
LanguageEnglish, Chinese
Detected LanguageEnglish
TypeText, bibliography
Formatprint, 103 leaves : ill. ; 30 cm.
RightsUse of this resource is governed by the terms and conditions of the Creative Commons “Attribution-NonCommercial-NoDerivatives 4.0 International” License (http://creativecommons.org/licenses/by-nc-nd/4.0/)

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