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Vacuum annealing effect of Fe₃₋xZnxO₄ thin films and trilayer magnetic tunneling junction. / Fe₃₋xZnxO₄的真空熱處理效應及磁隧道結 / Vacuum annealing effect of Fe₃-xZnxO₄ thin films and trilayer magnetic tunneling junction. / Fe₃-xZnxO₄ de zhen kong re chu li xiao ying ji ci sui dao jie

Lee Wai Tak Joseph = Fe₃₋xZnxO₄的真空熱處理效應及磁隧道結 / 李懷德. / On t.p. "-x" and "x" is subscript. / Thesis (M.Phil.)--Chinese University of Hong Kong, 2006. / Includes bibliographical references. / Text in English; abstracts in English and Chinese. / Lee Wai Tak Joseph = Fe₃₋xZnxO₄ de zhen kong re chu li xiao ying ji ci sui dao jie / Li Huaide. / Acknowledgement --- p.i / Abstract --- p.ii / 論文摘要 --- p.iii / Table of contents --- p.iv / List of Figures --- p.ix / List of Tables --- p.xiv / Table of Contents / Chapter Chapter 1 --- Introduction / Chapter 1.1 --- Introduction to Magnetite Fe3O4 and Zinc Ferrite Fe3.-xZnxO4 --- p.1-1 / Chapter 1.1.1 --- Crystal structure and Properties of Fe304 and Fe3-xZnxo4 --- p.1-1 / Chapter 1.1.2 --- Transformation of Iron Oxides --- p.1-6 / Chapter 1.2 --- Verwey transition --- p.1-10 / Chapter 1.2.1 --- Introduction --- p.1-10 / Chapter 1.2.2 --- Charge-orbital ordering --- p.1-15 / Chapter 1.3 --- Trilayer Magnetic Tunneling Junction (MTJ) --- p.1-18 / Chapter 1.3.1 --- Half-metallic Fe3O4 --- p.1-18 / Chapter 1.3.2 --- Tunneling Magnetoresistance (TMR) --- p.1-19 / Chapter 1.4 --- Research Motivation --- p.1-20 / Chapter 1.5 --- Scope of this thesis --- p.1-21 / References --- p.1-22 / Chapter Chapter 2 --- Instrumentation / Chapter 2.1 --- Sample Preparation --- p.2-1 / Chapter 2.1.1 --- Vacuum System --- p.2-1 / Chapter 2.1.2 --- Facing-target Sputtering (FTS) Technique --- p.2-3 / Chapter 2.2 --- Sample Treatment --- p.2-7 / Chapter 2.2.1 --- Vacuum Annealing (VA) --- p.2-7 / Chapter 2.2.2 --- Silver Electrode Coating System --- p.2-9 / Chapter 2.3 --- Sample Characterization --- p.2-11 / Chapter 2.3.1 --- Four-point-probe DC Resistivity Measurement --- p.2-11 / Chapter 2.3.2 --- Current-Voltage Measurement (IV) --- p.2-11 / Chapter 2.3.3. --- X-ray Diffraction (XRD) --- p.2-13 / Chapter 2.3.4 --- X-ray Fluorescence (XRF) Method --- p.2-14 / Chapter 2.3.5 --- Alpha-step Surface Profiler --- p.2-14 / Chapter 2.3.6 --- Atomic Force Microscope (AFM) --- p.2-15 / References --- p.2-16 / Chapter Chapter 3 --- Fabrication of Fe3- xZnxO4Thin Films / Chapter 3.1 --- Thin Film Deposition --- p.3-1 / Chapter 3.1.1 --- Review of Deposition Procedures --- p.3-1 / Chapter 3.1.2 --- Preparation of Substrates --- p.3-6 / Chapter 3.1.3 --- Deposition of Fe3-xZnxO4 thin films --- p.3-7 / Chapter 3.2 --- Characterization of Fe3-xZnxO4 thin films --- p.3-9 / Chapter 3.2.1 --- Surface Morphology --- p.3-9 / Chapter 3.2.2 --- Temperature-Dependent Resistivity Measurement --- p.3-11 / Chapter 3.3 --- Factors affecting the Quality of films --- p.3-18 / Chapter 3.3.1 --- Effect of Substrates --- p.3-18 / Chapter 3.3.2 --- Effects of Sputtering Power --- p.3-21 / Chapter 3.3.3 --- Effects of Temperature --- p.3-24 / Chapter 3.3.4 --- Effects of Thickness --- p.3-29 / Chapter 3.4 --- Chapter summary --- p.3-32 / References --- p.3-33 / Chapter Chapter 4 --- Vacuum Annealing of Fe3-xZnxO4 Thin Films / Chapter 4.1 --- Introduction --- p.4-1 / Chapter 4.2 --- Post-Annealing Effect in the Presence of Oxygen --- p.4-6 / Chapter 4.3 --- Vacuum Annealing of Fe3-xZnx04 thin films --- p.4-12 / Chapter 4.3.1 --- First Stage of Vacuum Annealing --- p.4-12 / Chapter 4.3.2 --- Second Stage of Vacuum Annealing --- p.4-17 / Chapter 4.3.3 --- Third Stage of Vacuum Annealing --- p.4-25 / Chapter 4.4 --- Chapter summary --- p.4-32 / References --- p.4-33 / Chapter Chapter 5 --- Trilayer Magnetic Tunneling Junction (MTJ) / Chapter 5.1 --- Introduction --- p.5-1 / Chapter 5.2 --- Fabrication of Trilayer Magnetic Tunneling Junction --- p.5-3 / Chapter 5.3 --- Tunneling Magnetoresistance (TMR) --- p.5-5 / Chapter 5.3.1 --- Current-Voltage Characteristic Curve (IV curve) --- p.5-5 / Chapter 5.3.2 --- Magnetoresistance Measurement --- p.5-8 / References --- p.5-10 / Chapter Chapter 6 --- Conclusions / Chapter 6.1 --- Conclusions --- p.6-1 / Chapter 6.2 --- Further research --- p.6-2 / References --- p.6-3

Identiferoai:union.ndltd.org:cuhk.edu.hk/oai:cuhk-dr:cuhk_325693
Date January 2006
ContributorsLee, Wai Tak Joseph., Chinese University of Hong Kong Graduate School. Division of Physics.
Source SetsThe Chinese University of Hong Kong
LanguageEnglish, Chinese
Detected LanguageEnglish
TypeText, bibliography
Formatprint, 1 v. (various pagings) : ill. ; 30 cm.
RightsUse of this resource is governed by the terms and conditions of the Creative Commons “Attribution-NonCommercial-NoDerivatives 4.0 International” License (http://creativecommons.org/licenses/by-nc-nd/4.0/)

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