Return to search

Fabrication of Fe3O4 and ZnxFe3-xO4 thin films and annealing effects. / Fe3O4和 ZnxFe3-xO4薄膜的制備及其熱處理效應 / Fabrication of Fe3O4 and ZnxFe3-xO4 thin films and annealing effects. / Fe3O4 he ZnxFe3-xO4 bo mo de chi bei ji qi re chu li xiao ying

Wong Hoi Chun = Fe3O4和 ZnxFe3-xO4薄膜的制備及其熱處理效應 / 黃凱俊. / On t.p. "x" is subscript / Thesis (M.Phil.)--Chinese University of Hong Kong, 2004. / Includes bibliographical references. / Text in English; abstracts in English and Chinese. / Wong Hoi Chun = Fe3O4 he ZnxFe3-xO4 bo mo de zhi bei ji qi re chu li xiao ying / Huang Kaijun. / Acknowledgement --- p.i / Abstract --- p.ii / 論文摘要 --- p.iii / Table of contents --- p.iv / List of Figures --- p.vii / List of Tables --- p.xiii / Chapter Chapter 1 --- Introduction / Chapter 1.1 --- Introduction to magnetite and zinc ferrite / Chapter 1.1.1 --- Structure and properties --- p.1-1 / Chapter 1.1.2 --- Deposition methods of magnetite and zinc ferrite --- p.1-5 / Chapter 1.1.3 --- Review of Verwey transition --- p.1-7 / Chapter 1.1.4 --- Development of magnetic tunneling junction --- p.1-11 / Chapter 1.2 --- Research motivation --- p.1-13 / Chapter 1.3 --- Scope of this thesis --- p.1-14 / References --- p.1-15 / Chapter Chapter 2 --- Instrumentation / Chapter 2.1 --- Thin film deposition / Chapter 2.1.1 --- Facing-target sputtering technique --- p.2-1 / Chapter 2.1.2 --- Vacuum system --- p.2-3 / Chapter 2.1.3 --- Asymmetric bipolar pulsed DC power source --- p.2-4 / Chapter 2.2 --- Annealing / Chapter 2.2.1 --- Vacuum annealing system --- p.2-8 / Chapter 2.2.2 --- Oxygen annealing system --- p.2-8 / Chapter 2.3 --- Characterization / Chapter 2.3.1 --- Profilometer --- p.2-10 / Chapter 2.3.2 --- X-ray diffractometer --- p.2-10 / Chapter 2.3.3 --- X-ray fluorescence spectrometer --- p.2-12 / Chapter 2.3.4 --- Rutherford backscattering spectrometer --- p.2-12 / Chapter 2.3.5 --- X-ray photoelectron spectroscopy --- p.2-13 / Chapter 2.3.6 --- Resistance measuring system --- p.2-15 / References --- p.2-17 / Chapter Chapter 3 --- Fabrication and characteristics of epitaxial Fe304 and ZnxFe3-xO4 single layer thin film / Chapter 3.1 --- Sample preparation / Chapter 3.1.1 --- Targets for reactive sputtering --- p.3-1 / Chapter 3.1.2 --- Substrates --- p.3-2 / Chapter 3.1.3 --- Deposition procedure --- p.3-4 / Chapter 3.2 --- Characterization of Fe3O4 thin films / Chapter 3.2.1 --- Effects of oxygen partial pressure --- p.3-5 / Chapter 3.2.2 --- Effects of substrate temperature --- p.3-10 / Chapter 3.2.3 --- Effects of deposition power --- p.3-17 / Chapter 3.2.4 --- Effects of deposition pressure --- p.3-19 / Chapter 3.2.5 --- Other factors --- p.3-19 / Chapter 3.3 --- Characterization of ZnxFe3-x04 thin films / Chapter 3.3.1 --- Effects of oxygen partial pressure --- p.3-22 / Chapter 3.3.2 --- Effects of substrate temperature --- p.3-28 / Chapter 3.3.3 --- Effects of thickness --- p.3-46 / Chapter 3.4 --- Fabrication and Characterization of ZnxFe3-x04 and Fe3O4 thin films on magnesium oxide(MgO) --- p.3-49 / References --- p.3-56 / Chapter Chapter 4 --- Annealing of epitaxial Fe304 and ZnxFe3-x04 thin films / Chapter 4.1 --- Introduction --- p.4-1 / Chapter 4.2 --- Vacuum annealing of ZnxFe3-x04 thin film / Chapter 4.2.1 --- Enhancement in magnitude of the Verwey transition --- p.4-1 / Chapter 4.2.2 --- Reduction in resistivity --- p.4-5 / Chapter 4.2.3 --- Improvement of crystallinity --- p.4-5 / Chapter 4.2.4 --- Characterizations after high-temperature annealing --- p.4-11 / Chapter 4.2.5 --- Oxygen diffusion in atmosphere --- p.4-16 / Chapter 4.3 --- Oxygen annealing of ZnxFe3-x04 thin film --- p.4-18 / References --- p.4-22 / Chapter Chapter 5 --- Conclusions / Chapter 5.1 --- Conclusions --- p.5-1 / Chapter 5.2 --- Future outlook --- p.5-2

Identiferoai:union.ndltd.org:cuhk.edu.hk/oai:cuhk-dr:cuhk_324591
Date January 2004
ContributorsWong, Hoi Chun., Chinese University of Hong Kong Graduate School. Division of Physics.
Source SetsThe Chinese University of Hong Kong
LanguageEnglish, Chinese
Detected LanguageEnglish
TypeText, bibliography
Formatprint, 1 v. (various paging) : ill. ; 30 cm.
RightsUse of this resource is governed by the terms and conditions of the Creative Commons “Attribution-NonCommercial-NoDerivatives 4.0 International” License (http://creativecommons.org/licenses/by-nc-nd/4.0/)

Page generated in 0.0019 seconds