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Low-energy radio-frequency sputtering of copper, anodized aluminum, and Kapton by argon plasma ions

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Identiferoai:union.ndltd.org:OhioLink/oai:etd.ohiolink.edu:case1058207091
Date January 1995
CreatorsKennedy, Monroe David, Jr.
PublisherCase Western Reserve University School of Graduate Studies / OhioLINK
Source SetsOhiolink ETDs
LanguageEnglish
Detected LanguageEnglish
Typetext
Sourcehttp://rave.ohiolink.edu/etdc/view?acc_num=case1058207091
Rightsunrestricted, This thesis or dissertation is protected by copyright: all rights reserved. It may not be copied or redistributed beyond the terms of applicable copyright laws.

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