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The Influence of Sapphire Substrate Pre-Baking Treatment on the Quality of GaN Epitaxy by MOCVD

The materials based on GaN have successfully developed on short-wavelength laser diodes (LDs), light-emitting diodes (LEDs) and ultraviolet photodetector. In this study, GaN epitaxial layers have been successfully grown on sapphire substrates. We used several methods including the pre-baking treatment for sapphire substrates before growing epilayer, the growth temperature of buffer layer and the growth temperature of GaN epilayer to study it. From the results of the photoluminescence (PL) measured at 77K, the X-Ray diffraction measurement, SEM cross sectional views to realize the characteristic and we get a better qualities of GaN epilayers after using the foregoing methods. In this study, the pre-baking treatment for sapphire substrates can influence the quality and morphology of GaN epilayers. According to the results of the experiments, we study the mechanisms of yellows luminescence and donor-acceptor pair (DAP).

Identiferoai:union.ndltd.org:NSYSU/oai:NSYSU:etd-0711102-114708
Date11 July 2002
CreatorsLin, Yen-Liang
Contributorsnone, none, Ming-Kwei Lee, none
PublisherNSYSU
Source SetsNSYSU Electronic Thesis and Dissertation Archive
LanguageEnglish
Detected LanguageEnglish
Typetext
Formatapplication/pdf
Sourcehttp://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0711102-114708
Rightsnot_available, Copyright information available at source archive

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