Tam Yi Mei. / Thesis (M.Phil.)--Chinese University of Hong Kong, 2004. / Includes bibliographical references. / Abstracts in English and Chinese. / Abstract --- p.ii / 摘要 --- p.iii / Acknowledgement --- p.iv / Table of Contents --- p.v / List of Figures --- p.ix / List of Tables --- p.xii / Chapter Chapter 1 --- Background of study --- p.1 / Chapter 1.1 --- Introduction --- p.1 / Chapter 1.2 --- Theoretical background of XPS --- p.2 / Chapter 1.2.1 --- Principle of XPS --- p.2 / Chapter 1.2.2 --- Surface sensitivity --- p.6 / Chapter 1.2.3 --- Inelastic Mean Free Path (IMFP) --- p.6 / Chapter 1.3 --- XPS spectral features --- p.7 / Chapter 1.3.1 --- Chemical shift --- p.8 / Chapter 1.3.2 --- Spin orbital splitting (SOS) --- p.8 / Chapter 1.4 --- Quantitative analysis in XPS --- p.10 / Chapter 1.4.1 --- Atomic concentration --- p.10 / Chapter 1.4.2 --- Layer thickness determination --- p.11 / Chapter 1.5 --- The new XPS analysis technique in the present study --- p.14 / Chapter 1.5.1 --- Ion sputtering --- p.14 / Chapter 1.5.1.1 --- Sputtering-induced defects --- p.16 / Chapter 1.5.1.2 --- Effects of ion incident angle --- p.17 / Chapter 1.5.1.3 --- Depth resolution --- p.17 / Chapter 1.5.2 --- Perpendicular detection --- p.19 / Chapter 1.6 --- Objectives of present study --- p.23 / References for Chapter1 --- p.24 / Chapter Chapter 2 --- Instrumentation --- p.28 / Chapter 2.1 --- Introduction --- p.28 / Chapter 2.2 --- X-ray Photoelectron Spectroscopy --- p.28 / Chapter 2.2.1 --- XPS used in the present study --- p.28 / Chapter 2.2.2 --- Vacuum requirements --- p.29 / Chapter 2.2.3 --- X-ray source --- p.29 / Chapter 2.2.4 --- Charge Neutralizer --- p.33 / Chapter 2.2.5 --- Ion sputtering gun --- p.34 / Chapter 2.2.6 --- Electron energy analyzer --- p.36 / Chapter 2.2.6.1 --- Energy resolution --- p.38 / Chapter 2.2.6.2 --- Pass energy --- p.38 / Chapter 2.2.7 --- Electron detector / Multiplier --- p.39 / Chapter 2.3 --- Other analysis techniques for verification --- p.42 / Chapter 2.3.1 --- Energy Dispersive X-ray detector in Scanning Electron Microscope (SEM-EDX) --- p.42 / Chapter 2.3.2 --- X-ray Fluorescence Spectrometer (XRF) --- p.42 / Chapter 2.3.3 --- Rutherford Backscattering Spectrometer (RBS) --- p.43 / Chapter 2.3.4 --- Differential Scanning Calorimeter (DSC) --- p.44 / References for Chapter2 --- p.45 / Chapter Chapter 3 --- Determination of the thickness of the damaged layer --- p.46 / Chapter 3.1 --- Introduction --- p.46 / Chapter 3.2 --- Experimentation --- p.46 / Chapter 3.2.1 --- Instrumentation --- p.46 / Chapter 3.2.1.1 --- Work function calibration --- p.48 / Chapter 3.2.1.2 --- Sputtering ion beam calibration --- p.49 / Chapter 3.2.2 --- Sample preparation --- p.49 / Chapter 3.2.3 --- XPS measurements --- p.51 / Chapter 3.3 --- Results and discussion --- p.53 / Chapter 3.3.1 --- Spectral analysis and peak fitting --- p.53 / Chapter 3.3.2 --- Modeling and damaged layer thickness determination --- p.59 / Chapter 3.3.3 --- TRIM simulation --- p.62 / Chapter 3.4 --- Conclusion --- p.65 / References for Chapter3 --- p.68 / Chapter Chapter 4 --- Applications of the new XPS technique to different materials --- p.70 / Chapter 4.1 --- Introduction --- p.70 / Chapter 4.2 --- Analysis of ceramic --- p.70 / Chapter 4.2.1 --- Experimentation --- p.71 / Chapter 4.2.2 --- XPS results and comparison with other analysis techniques --- p.74 / Chapter 4.3 --- Analysis of metal alloys --- p.77 / Chapter 4.3.1 --- Experimentation for the tin-lead solder bump analysis --- p.78 / Chapter 4.3.2 --- Calibration of XPS sensitivity --- p.78 / Chapter 4.4 --- Development of XPS analysis method for the tin-silver solder bump measurement --- p.82 / Chapter 4.4.1 --- Experimentation --- p.83 / Chapter 4.4.2 --- XPS results --- p.83 / Chapter 4.5 --- Analysis of polymer (Polyacrylic acid) --- p.84 / Chapter 4.5.1 --- XPS results --- p.84 / Chapter 4.6 --- Analysis of Indium Phosphide --- p.90 / Chapter 4.6.1 --- XPS results --- p.92 / Chapter 4.7 --- Analysis of Gallium Arsenide --- p.96 / Chapter 4.8 --- Conclusion --- p.100 / References for Chapter4 --- p.101 / Chapter Chapter 5 --- Conclusions --- p.102
| Identifer | oai:union.ndltd.org:cuhk.edu.hk/oai:cuhk-dr:cuhk_324882 |
| Date | January 2004 |
| Contributors | Tam, Yi Mei., Chinese University of Hong Kong Graduate School. Division of Chemistry. |
| Source Sets | The Chinese University of Hong Kong |
| Language | English, Chinese |
| Detected Language | English |
| Type | Text, bibliography |
| Format | print, xiii, 103 leaves : ill. ; 30 cm. |
| Rights | Use of this resource is governed by the terms and conditions of the Creative Commons “Attribution-NonCommercial-NoDerivatives 4.0 International” License (http://creativecommons.org/licenses/by-nc-nd/4.0/) |
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