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Design of a Monitoring System for a Plasma Cleaning Machine

Plasma cleaning is the most effective dry process to remove surface contaminates from a SAW (Surface Acoustical Wave) device. Consistent gas pressures, flows, and good electrical connections between the chamber shelves are necessary for the process to function predictably. In addition, operation of the monitoring system must be transparent to the plasma cleaning unit. This thesis describes a simple solution to the complex problem of monitoring a plasma cleaning system. The monitoring system uses the LabVIEW® G programming language and hardware, both products of National Instruments, Inc.®, to monitor critical parameters necessary to achieve a consistent process when cleaning these devices.

Identiferoai:union.ndltd.org:unt.edu/info:ark/67531/metadc279056
Date05 1900
CreatorsFooks, Terry M. (Terry Max)
ContributorsMcNeill, Perry R., Watt, George William, Foster, Phillip R., Bratcher, Wayne
PublisherUniversity of North Texas
Source SetsUniversity of North Texas
LanguageEnglish
Detected LanguageEnglish
TypeThesis or Dissertation
Formatvii, 72 leaves : ill., Text
RightsPublic, Copyright, Copyright is held by the author, unless otherwise noted. All rights reserved., Fooks, Terry M. (Terry Max)

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