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The Study and Fabrication of 2D amd Modified 1D Photonic Crystal Microcavity

In this thesis, we fabricated the 2D photonic crystal and modified 1D photonic crystal microcavity on the InGaAs/GaAs substrate by E-beam lithography. The wafer are grown by molecular beam epitaxy (MBE) on GaAs substrate. The active layer consists of six InGaAs quantum wells at 1050nm emission wavelength.
For the 1D photonic crystal microcavity (DBR laser),we changed the cavity shape and length to match the mode of light in the cavity. It can increase the reflectivity of the laser. In our simulations, we scanned different cavity length and found the corresponding data. We designed two and three pairs of DBRs formed on the edge of laser cavity, respectively. The cavity length is 121µm and the mirror width is 230nm and the air gap is 263nm.
For the 2D photonic crystal (2DPC) microcavity, a triangular array of air columns was adopted. The lattice constant and air columns radius are 742nm and 304nm, respectively. The TE modes photonic band gap of this structure are corresponding to wavelength range in 1026nm ~ 1089nm. We placed single defect in the 2DPCs to form 2DPC microcavities and the corresponding defect modes are 1051.58nm¡B1053.39nm and 1054.87nm. In addition, we reduced the air columns around the cavity and simulated the photonic bandgap and fabricated the devices by E-beam lithography and deep dry etching process.

Identiferoai:union.ndltd.org:NSYSU/oai:NSYSU:etd-0721105-155623
Date21 July 2005
CreatorsLi, Ming-Chun
ContributorsTao-Yuan Chang, Ming-Hua Mao, Tsong-Sheng Lay, Hao-Chung Kuo, Shoou-Jinn Chang
PublisherNSYSU
Source SetsNSYSU Electronic Thesis and Dissertation Archive
LanguageCholon
Detected LanguageEnglish
Typetext
Formatapplication/pdf
Sourcehttp://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0721105-155623
Rightsrestricted, Copyright information available at source archive

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