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Pattern dependencies in the plasma etching of polysilicon

Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Chemical Engineering, 1994. / Includes bibliographical references (p. 423-441). / by Timothy Joseph Dalton. / Ph.D.

Identiferoai:union.ndltd.org:MIT/oai:dspace.mit.edu:1721.1/11655
Date January 1994
CreatorsDalton, Timothy Joseph
ContributorsHerbert H. Sawin., Massachusetts Institute of Technology. Dept. of Chemical Engineering
PublisherMassachusetts Institute of Technology
Source SetsM.I.T. Theses and Dissertation
LanguageEnglish
Detected LanguageEnglish
TypeThesis
Format687 p., 33570662 bytes, 33570418 bytes, application/pdf, application/pdf, application/pdf
RightsM.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission., http://dspace.mit.edu/handle/1721.1/7582

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