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Study of plasma-surface kinetics and simulation of feature profile evolution in chlorine etching of patterened polysilicon

Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Chemical Engineering, 1998. / Includes bibliographical references (p. 163-170). / by Jane Pei-chen Chang. / Ph.D.

Identiferoai:union.ndltd.org:MIT/oai:dspace.mit.edu:1721.1/50356
Date January 1998
CreatorsChang, Jane Pei-chen, 1967-
ContributorsHerbert H. Sawin., Massachusetts Institute of Technology. Dept. of Chemical Engineering
PublisherMassachusetts Institute of Technology
Source SetsM.I.T. Theses and Dissertation
LanguageEnglish
Detected LanguageEnglish
TypeThesis
Format218 p., application/pdf
RightsM.I.T. theses are protected by copyright. They may be viewed from this source for any purpose, but reproduction or distribution in any format is prohibited without written permission. See provided URL for inquiries about permission., http://dspace.mit.edu/handle/1721.1/7582

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