Controlling activation energy to wafers and walls in plasma processing reactors for microelectronics fabrication /

Description

Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 2007. / Source: Dissertation Abstracts International, Volume: 69-02, Section: B, page: 1151. Adviser: Mark J. Kushner. Includes bibliographical references. Available on microfilm from Pro Quest Information and Learning.

Links & Downloads

1. http://gateway.proquest.com/openurl?url_ver=Z39.88-2004&rft_val_fmt=info:ofi/fmt:kev:mtx:dissertation&res_dat=xri:pqdiss&rft_dat=xri:pqdiss:3301097

Tags

Additional Fields

Identifer	oai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/298436017
Date	January 2007
Creators	Agarwal, Ankur,
Source Sets	OCLC
Language	English
Detected Language	English