This thesis deals with surface analysis and characterization of optical features of thin films created by hexamethyldisiloxane (HMDSO) plasma polymerization on silicon wafers. The RF plasma industrial deposition equipment was used for the thin layers formation. These thin films serve as protective coatings on the reflective layer in the car light or solar panels. Theoretic part gives basic information about plasma, its occurrence, features, diagnostics and applications. Thin layers, their production and characterization are discussed here, too. Theoretic description of monomer material (including the group of other organosilicones) is also presented here. The FTIR spectroscopy and elipsometry are mentioned as the main methods for thin films characterisation. Because material during its practical use degrades due to external conditions, the influence of them on the thin layer properties is studied using the accelerated aging of created films. Industrial deposition chamber AluMet 1800V made by Leybold Optics, Ltd. installed in Zlin Precision company was used for the thin films production. Thin films were created under different conditions that were selelected near to the real conditions used in technology. Various applied powers (2-5 kW) were used for the deposition under different monomer flows. Further, the influence of oxygen addition on the created film properties was investigated. The deposition process was monitored by optical emission spectroscopy. The spectrometer Jobin Yvon Triax 320 with CCD detector was used. The selected part from every samples set was exposed by UV radiation (48 hours at radiation density of 0.68 W/m2 at 340 nm) to simulate the probable conditions during the layers real use. The surface properties were investigated by measurement of reflected light spectral intensity in the visible range at different angles. The angle between incident and reflected beam was varied in the interval of 40 - 150° with 10° step. The influence of sample preparation conditions as well as their aging effect was studied at the selected angles. Spectral reflectance doesn´t depend significantly on applied discharge power and oxygen addition. The significant shift of reflectance into the red part of spectrum was observed at UV exposed samples more or less independently on the applied discharge power of monomer flow rate. Addition of oxygen during the deposition suppresses this effec significantly. Characterization of thin layer structure was done by FTIR spectroscopy. No significant changes were observed in the structure at different discharge powers of monomer flow rates except total absorption intensities that are proportional to the layr thickness. The oxygen addition, of course, changes the structure significantly. These results are only preliminary because the layers were very thin (deposition conditions were near to the common process standard) and thus the signal/noise ratio was relatively low.
| Identifer | oai:union.ndltd.org:nusl.cz/oai:invenio.nusl.cz:216504 |
| Date | January 2009 |
| Creators | Rozsívalová, Zdeňka |
| Contributors | Studýnka, Jan, Krčma, František |
| Publisher | Vysoké učení technické v Brně. Fakulta chemická |
| Source Sets | Czech ETDs |
| Language | Czech |
| Detected Language | English |
| Type | info:eu-repo/semantics/masterThesis |
| Rights | info:eu-repo/semantics/restrictedAccess |
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