Multiscale approaches for simulation of nucleation, growth, and additive chemistry during electrochemical deposition of thin metal films /

Description

Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 2008. / Source: Dissertation Abstracts International, Volume: 69-11, Section: B, page: 6990. Adviser: Richard C. Alkire. Includes bibliographical references. Available on microfilm from Pro Quest Information and Learning.

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1. http://gateway.proquest.com/openurl?url_ver=Z39.88-2004&rft_val_fmt=info:ofi/fmt:kev:mtx:dissertation&res_dat=xri:pqdiss&rft_dat=xri:pqdiss:3337829

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Identifer	oai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/436146690
Date	January 2008
Creators	Stephens, Ryan Mark,
Source Sets	OCLC
Language	English
Detected Language	English