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Cost analysis on the use of chamber cleaning agents nitrogen trifluoride and chlorine trifluoride in the semiconductor industry

Thesis, PlanB (M.S.)--University of Wisconsin--Stout, 1999. / Includes bibliographical references.

Identiferoai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/42287664
Date January 1999
CreatorsEmmerich, Jodi.
Source SetsOCLC
LanguageEnglish
Detected LanguageEnglish
SourceOnline version

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