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Growth of III-nitride nano-materials by chemical vapor deposition. / 用化学气相淀积方法生长氮化物纳米材料 / Growth of III-nitride nano-materials by chemical vapor deposition. / Yong hua xue qi xiang dian ji fang fa sheng chang dan hua wu na mi cai liao

Hong Liang = 用化学气相淀积方法生长氮化物纳米材料 / 洪亮. / Thesis (M.Phil.)--Chinese University of Hong Kong, 2006. / Includes bibliographical references. / Text in English; abstracts in English and Chinese. / Hong Liang = Yong hua xue qi xiang dian ji fang fa sheng chang dan hua wu na mi cai liao / Hong Liang. / Acknowledgements --- p.ii / Abstract --- p.iii / Contents --- p.v / Chapter Chapter 1 --- Introduction / Chapter 1.1 --- Background --- p.1 / Chapter 1.2 --- Motivation --- p.2 / Chapter 1.2.1 --- A1N and AlGaN nanowires --- p.2 / Chapter 1.2.2 --- CVD --- p.3 / Chapter 1.3 --- Our work --- p.3 / Chapter Chapter 2 --- Experiment --- p.7 / Chapter 2.1 --- CVD system --- p.7 / Chapter 2.2 --- Sources and Substrates --- p.7 / Chapter 2.3 --- Growth of A1N nanowires --- p.8 / Chapter 2.4 --- Growth of AlGaN nanowires --- p.9 / Chapter Chapter 3 --- Characterization --- p.11 / Chapter 3.1 --- Scanning Electron Microscopy --- p.11 / Chapter 3.1.1 --- Topographic images by secondary electrons --- p.11 / Chapter 3.1.2 --- Elemental Analysis by Energy Dispersive X-ray --- p.12 / Chapter 3.2 --- Transmission Electron Microscopy --- p.12 / Chapter 3.3 --- X-Ray Diffraction --- p.14 / Chapter 3.4 --- Micro-Raman --- p.15 / Chapter Chapter 4 --- Results and Discussion --- p.18 / Chapter 4.1 --- A1N nano-structures --- p.18 / Chapter 4.1.1 --- A1N nano-leaves grown on silicon substrates --- p.18 / Chapter 4.1.2 --- A1N nanowires grown on silicon substrates --- p.19 / Chapter 4.1.3 --- SiNx nanowires grown on silicon substrates --- p.22 / Chapter 4.1.4 --- A1N nanowires grown on sapphire substrates --- p.26 / Chapter 4.1.5 --- Comparison with the results of other research groups --- p.31 / Chapter 4.2 --- AlGaN nano-structures --- p.33 / Chapter 4.2.1 --- AlGaN nanowires grown on silicon substrates --- p.33 / Chapter 4.2.2 --- Temperature dependence --- p.38 / Chapter 4.2.3 --- The influence of the mass ratio (Ga/Al) in the precursor metal sources --- p.43 / Chapter 4.2.4 --- Substrate effect --- p.46 / Chapter Chapter 5 --- Suggestion of the growth mechanism --- p.51 / Chapter 5.1 --- Growth mechanisms: an introduction --- p.51 / Chapter 5.2 --- The growth mechanisms for our produced samples --- p.57 / Chapter 5.2.1 --- Growth mechanism for A1N nanowires --- p.58 / Chapter 5.2.2 --- Growth mechanism for AlGaN nanowires --- p.61 / Chapter 5.2.3 --- Substrate effect --- p.65 / Chapter Chapter 6 --- Conclusions --- p.71 / Appendix --- p.73

Identiferoai:union.ndltd.org:cuhk.edu.hk/oai:cuhk-dr:cuhk_325539
Date January 2006
ContributorsHong, Liang., Chinese University of Hong Kong Graduate School. Division of Physics.
Source SetsThe Chinese University of Hong Kong
LanguageEnglish, Chinese
Detected LanguageEnglish
TypeText, bibliography
Formatprint, vi, 74 leaves : ill. ; 30 cm.
RightsUse of this resource is governed by the terms and conditions of the Creative Commons “Attribution-NonCommercial-NoDerivatives 4.0 International” License (http://creativecommons.org/licenses/by-nc-nd/4.0/)

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