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Target Thickness Dependence of Cu K X-Ray Production for Ions Moving in Thin Solid Cu Targets

Measurements of the target thickness dependence of the target x-ray production yield for incident fast heavy ions are reported for thin solid Cu targets as a function of both incident projectile atomic number and energy. The incident ions were F, Al, Si, S, and CI. The charge state of the incident ions was varied in each case to study the target x-ray production for projectiles which had an initial charge state, q, of q = Z₁, q = Z₁ - 1, and q < Z₁ - 1 for F, Al, Si, and S ions and q = Z₁ - 1 and q < Z₁ - 1 for C1 ions. The target thicknesses ranged from 2 to 183 ug/cm². In each case the Cu K x-ray yield exhibits a complex exponential dependence on target thickness. A two-component model which includes contributions to the target x-ray production due to ions with 0 and 1 K vacancies and a three-component model which includes contributions due to ions with 0, 1, and 2 K vacancies are developed to describe the observed target K x-ray yields. The two-component model for the C1 data and the three-component model for the F, Al, Si, S, and C1 data are fit to the individual data for each projectile, and the cross sections for both the target and projectile are determined. The fits to the target x-ray data give a systematic representation of the processes involved in x-ray production for fast heavy ions incident on thin solid targets.

Identiferoai:union.ndltd.org:unt.edu/info:ark/67531/metadc332141
Date12 1900
CreatorsGardner, Raymond K.
ContributorsGray, Thomas James, 1917-, Deering, William D., Roberts, James Andrew, Mackey, H. J., Redding, Rogers W.
PublisherNorth Texas State University
Source SetsUniversity of North Texas
LanguageEnglish
Detected LanguageEnglish
TypeThesis or Dissertation
Formatvi, 84 leaves : ill., Text
RightsPublic, Gardner, Raymond K., Copyright, Copyright is held by the author, unless otherwise noted. All rights reserved.

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